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Phase-controlled Growth And Physical Properties Of In2Se3 Compounds

Posted on:2021-03-09Degree:MasterType:Thesis
Country:ChinaCandidate:X B YinFull Text:PDF
GTID:2381330623468425Subject:Engineering
Abstract/Summary:PDF Full Text Request
Indium selenide?chemical formula:In2Se3?is an important group III-VI direct bandgap layered semiconductor material.Five main crystal phases have been found,namely:?,?,?,?,and?.Indium selenide thin film materials have been widely used in solar cells,photoelectric detection,phase change memory,etc.Because the indium selenide film phase is easy to transition with the temperature change during the growth process,the growth of single crystal indium selenide film becomes relatively difficult.The traditional preparation techniques include:magnetron sputtering method,source co-evaporation method,chemical bath deposition method,solid phase reaction method,metal organic chemical vapor deposition method,electrodeposition method,sol-gel method.However,these methods are difficult to grow high-quality single crystal thin films.At present,it has been reported that the thin film growth technology that can prepare all five main crystal phases of In2Se3 is molecular beam epitaxy,but many basic problems of molecular beam epitaxy method for growing In2Se3 have not been fully studied.On the other hand,due to the low-quality of the In2Se3 thin film prepared by the existing methods,it has restricted the indepth study of the intrinsic physical properties of In2Se3,which has further affected the application of In2Se3.Therefore,this paper will focus on the growth of indium selenide thin film by molecular beam epitaxy and its basic physical characterization.The work includes:?1?In2Se3 single crystal thin films were prepared on H-Si?111?substrates,beveled 4°H-Si?111?and molybdenum-fluoride phlogopite substrates.The preparation process and growth kinetics of indium selenide film were systematically studied.It provides a reference for the study of epitaxial growth of single crystal indium selenide film and the study of heterojunction band.First,the effects of growth beam conditions?in terms of beam equivalent pressure?on the resulting film were investigated through experiments.Within a certain temperature range,it is found that when the beam ratio of Se:In is about15:1-20:1,it tends to obtain a single crystal thin film with a stoichiometric ratio of In2Se3.When the beam ratio of Se:In is less than 15,the film is InSe.And when the Se:In beam ratio is greater than 20,the stoichiometric ratio In6Se7 or In2Se3-In6Se7 continuous binary solid solution film can be obtained.The relationship between the phase structure of the epitaxial thin film conforming to the stoichiometric ratio In2Se3 under 15:1-20:1optimized beam current ratio and growth temperature were further studied.It is concluded that the?-In2Se3 film can be obtained with the growth temperature in the range of 100?-150?,?-In2Se3 in 200?-250?,and?-In2Se3 in 300?-350?.?2?The physical properties of the prepared indium selenide films were studied.A series of thin film samples of different thicknesses were grown using molecular beam epitaxy systems.And the surface morphology and crystal structure of the?-In2Se3 thin films obtained by scanning tunneling microscope?STM?,scanning electron microscope?SEM?,reflective high energy electron diffractometer?RHEED?,high resolution X-ray diffractometer?HRXRD?,and Raman spectrometer.The structure characteristics of?-In2Se3 thin film were accurately determined.The atomic force microscope?AFM?was used to study the ferroelectric properties of the?-In2Se3 thin film.The vibration analysis of the?-In2Se3 thin film was carried out by Raman spectroscopy.The optical energy band of the?-In2Se3 thin film was inferred to be 1.94eV by photoluminescence spectroscopy.In addition,the?-In2Se3 film with thickness of 200nm was studied for light transmittance,and found that for light with a wavelength in the range of 0.5?m-2.5?m,when the wavelength is 1?m,the transmittance is 60%,and at 1.5?m,the transmission rate is as high as 90%.Electrical tests on the?-In2Se3 thin film indicate that the film resistivity is on the order of 104?cm,and under simulated solar lighting conditions,the film resistivity is on the order of 103?cm.The photoelectric switch ratio of?-In2Se3 thin film device under daylight conditions is greater than 10.Further photoelectric response test showed that the photocurrent density of the optimized?-In2Se3 thin film was 3.15mA/cm2.
Keywords/Search Tags:In2Se3, molecular beam epitaxy, high energy electron diffraction, scanning tunneling microscope, photocurrent
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