Research On SERS Detection Technology Based On Nano Sensing

Nano-sensing technology has shown advantages in physical quantity detection.In terms of chemical quantity and biomass detection,due to the constraints of materials,structures and processes,its specificity and flexibility cannot meet the rapid development of biological and chemical fields.At the same time,with the advancement of nanomaterial preparation and detection technology,the application of nanotechnology in biological field is becoming increasingly mature.First,in this work,the principle and main theoretical basis of surface enhanced Raman spectroscopy(SERS)combined with nano-sensing technology was introduced.By surface modification treatment of the substrates of different materials,it is found that when the HF acid corrosion concentration is 10-15%and the etching time is about15 minutes,the Raman surface enhancement factor reaches a maximum value and the surface morphology treatment obtains optimal effect.Secondly,the lithography process in the integrated circuit manufacturing process was utilized to fabricate the gully structure on the surface of the silicon wafer.After plating a layer of gold,a novel I-SERS substrate was prepared,and a comparative test analysis was conducted to compare I-SERS with the Q-SERS substrate on the market.It is concluded that the Q-SERS substrate has excellent single-point Raman activity and Raman signal uniformity,while the I-SERS substrate has certain advantages in repeated detection and stability.Then,a novel nanostructured SERS substrate,namely E-SERS,was prepared by electron beam exposure and other methods.The Raman enhancement factor of E-SERS can reach above 10~4,and the effects of shape,size and spacing of nanostructures on SERS performance were analyzed.When the size of the SERS substrate pattern ranges from 50 to 300 nm,the SERS intensity of the substrate decreases first and then increases as the size decreases.Finally,the preparation of SERS substrates in the future was proposed.The precision lithography technology in the IC process,combined with the advantages of nano-etching and templated nanoimprinting,enables accurate mass production of SERS substrates.