Preparation Of Tunable Structural Color Devices By Microsphere Assisted Method

The interaction between light and micro nano structure will produce a kind of physical color which is different from that of traditional dyes,this kind of color is called structural color.In recent years,metal micro nanostructure color has shown good optical and electrical response,wide and narrow band filtering characteristics and device integration compatibility,which makes it have great application potential in such fields as remote real-time color control,data storage and ultra-high resolution display.At the same time,the development of modern lithography,nano imprinting and microsphere assisted fabrication which is very suitable for the preparation of micro nanostructures in large area from bottom to top,provides beneficial conditions for the preparation of large area structure color devices.In this paper,the preparation technology of micro and nano structure and the research of surface plasmon structure color are summarized.The simulation tools used in this paper and the methods of microsphere assembly and auxiliary preparation of micro / nano structure are introduced.In the research of structure color devices,based on the planar MIM(metal / dielectric / metal)structure filter,through the related surface plasmon theory,we learn the hole and disk array structure devices.At the same time,the key parameters of the design structure in this paper are studied.The static tuning display of panchromatic domain can be achieved by adjusting the parameters of the film,and the reflection efficiency can reach more than 80%.Combined with the electric field distribution simulated by CST simulation,each structure is analyzed,and the surface plasmon coupling is increased on the basis of fabry-pérot(F-P)cavity tuning.The tuning of hole array reflective structure mainly depends on the superposition of F-P cavity resonance formed by multilayer film and surface plasmon(SP)excited by metal hole array.In this paper,the device is fabricated and the reflection spectrum is tested.In the reflective structure of disk array,the tuning is affected by the size and period of a single metal disk,which is not only attached to the metal disk in this structure Local plasmon resonance(LSPR)occurs in the vicinity,and the near-field coupling between disks also occurs at a certain space distance.At the same time,the performance of micron size disk array devices in visible light has also been experimentally prepared and studied.It is found that the device can maintain areflection efficiency of more than 70% in the case of large angle deflection angle,and has good structure color tuning performance in the visible light band.Two methods of dynamic tuning structure color devices are proposed: one is to use the sensitivity of metal particle surface to dielectric environment,change the refractive index of solution to achieve dynamic tuning of structure color,which can be participated by different concentrations of high refractive index transparent solution.This dynamic tuning method is simple and easy to implement,and can be effectively prepared by using the microsphere assisted preparation method Large area devices with good morphology.In addition,a novel dynamic tunable device and its preparation method are proposed: the conical sub wavelength structure is prepared by the microsphere assisted method and applied to the formation and tuning of structural color devices.Due to the formation of the three-dimensional conical array structure,the surface plasmon phenomenon is different from that of the plane structure,and such a structure can easily form metal nanowires when the metal ions move under a small voltage.The metal nanowires will naturally change the dielectric coefficient of the intermediate layer and the interface around it,and the reflection spectrum of the device will also change.In this part the feasibility of the preparation and the expected effect of the device is preliminarily verified.At the same time,a simplified model is established for simulation calculation,the work in this section provides a method for the preparation of large area memristor and remote real-time control of structure color.