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Fabrication Of Microneedle Array Based On Micro-fabrication Technology

Posted on:2021-04-19Degree:MasterType:Thesis
Country:ChinaCandidate:W Y WuFull Text:PDF
GTID:2392330614956415Subject:Mechanical and electrical engineering
Abstract/Summary:PDF Full Text Request
Based on the research of micro-electromechanical system(MEMS)microfabrication technology,the processing method of microneedle array mold and the fabrication of microneedle array were studied.Focused on the microneedle array fabrication process by wet etching of silicon combined with SU-8 photoresist lithography process,Inclined and rotating UV lithography and moving X-ray lithography,as well as the process of preparing the microneedle array by using transfer technology.The Primary mold of the microneedle array was prepared,and the secondary mold of the microneedle array of polydimethylsiloxane(PDMS)material and epoxy resin material was transferred.The microneedle array structure was successfully fabricated and the performance of the microneedle array was performed test.Anisotropic wet etching of silicon and UV lithography process were used to prepare the microneedle tip part and microneedle column part,respectively,and finally the complete microneedle array concave structure was obtained on the silicon substrate.By changing the size of the mask pattern and controlling the thickness of the negative photoresist,microneedle array concave structures with different heights and different widths can be prepared.Conical microneedle array concave structure was successfully fabricated by using inclined and rotating UV lithography process and SU-8 dry film instead of traditional glue dumping process.Using plane-pattern to cross-section technique(PCT),the polymethyl methacrylate(PMMA)photoresist is perpendicular to the X-ray,moving back and forth in the plane,and after being developed,Finally,a three-dimensional structure similar to the X-ray mask pattern is fabricated on the PMMA photoresist.Then using PDMS transfer and electroplating technology to prepare metal nickel microneedle array and blood collection microneedle array structure,and performance testing.Finally,in order to reduce the processing cost of the microneedle array and shorten the preparation cycle of the microneedle array,PDMS transfer technology was used to prepare secondary and three-level mold.Finally,dissolving microneedle arrays were successfully prepared,providing feasibility for mass production of microneedle products.In addition,the hardness test and transdermal test of the microneedle array were performed to provide a basis for the transdermal administration of microneedles.
Keywords/Search Tags:Micro-Fabrication Technology, Microneedle Array, Wet Etching, UV-LIGA, PCT, Transfer technology
PDF Full Text Request
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