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Study On The Key Technologies Of Reactive Ion Beam Figuring

Posted on:2018-01-28Degree:MasterType:Thesis
Country:ChinaCandidate:Z P ZhangFull Text:PDF
GTID:2392330623950594Subject:Mechanical engineering
Abstract/Summary:PDF Full Text Request
With the development of some large equipment such as inertial confinement fusion(ICF),telescopes and weapons,the demand for high quality optical components is increasing.Ion beam figuring(IBF)as a high accuracy technology for optics mirrors figuring,the material removal efficiency is not high and it usually can't improve the surface roughness.Reactive ion beam figuring(RIBF)is based on the IBF technology,it uses reactive gases as the working gases instead inert gases,so that it combines physical and chemical effects to remove material.The RIBF process has good isotropy because of the reactive gases,the material removal efficiency of RIBF process is higher than IBF process.At present,there are few researches on RIBF process at home and abroad,it usually used to etch microstructure.The RIBF processing system is built in this paper,the basic mechanism and material removal characteristic of RIBF process are studied.And using the RIBF process to improve the material removal efficiency and surface roughness.The major job of this paper includes the following points.1.The basic mechanism of material removal for RIBF is researched,and the principle of using reactive gases,ion sources and neutralizers is analyzed.And building the RIBF processing system for following studies and experiments.2.Research on the RF(radio frequency)neutralizer for RIBF processing machine.Studying the working principle and designing the structure of RF neutralizer,and researching the performance by experiment.The factors that affect its performance are researched.3.The material removal characteristic of RIBF process for the fused silica is studied.The removal function and characteristic of chemical reaction are discussed,and the influence of chemical gases and the material removal efficiency of RIBF process are researched.And study on the surface roughness of RIBF process for optics mirrors.4.Study on the differences between RIBF process and IBF process for fused silica.The performance of shape processing for RIBF is similar to IBF,they can also produce high accuracy optical surface,and RIBF process can improve the working efficiency.The surface roughness is discussed,the experiments prove that the surface roughness almost can't be changed by IBF process,but it can be improved by RIBF process.
Keywords/Search Tags:Reactive Ion Beam Figuring, Ion Beam Figuring, Reactive Gases, Physical Sputtering, Chemical Reaction, Radio Frequency Neutralizer, Material Removal Efficiency, Surface Roughness
PDF Full Text Request
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