Measurement and Control of In-plane Surface Chemistry at the Silicon/Silicon Dioxide Interface

In-plane directional control of surface chemistry during interface formation can lead to new opportunities regarding device structures and applications. Control of this type requires techniques that can probe and hence provide feedback on the chemical reactivity of bonds not only in specific directions but also in real time. In this thesis work, I demonstrate both control and measurement of the oxidation of H-terminated Si(111).;The nonlinear optical tool of Second-Harmonic-Generation (SHG) is used to show that Si oxidation in air is a two-stage process where the H of the “up” bonds of the outermost Si layer is replaced by OH, followed by O insertion into the “back” bonds. Detailed information about both stages is revealed by investigating the effect of uniaxial strain and carrier concentration on this chemical reaction. It is shown that even small amounts of strain manipulate the reaction kinetics of surface bonds significantly, with tensile strain enhancing oxidation and compressive strain retarding it. This dramatic change suggests a strain-driven charge transfer mechanism between Si–H up bonds and Si–Si back bonds in the outer layer of Si atoms.;Data on differently doped samples reveal that high concentrations of electrons increase the chemical reactivity of the outer-layer Si–Si back bonds relative to the Si–H up bonds while high concentrations of holes cause a greater increase in the reactivity of the Si–H up bonds than that of the Si–Si back bonds. However, the thicknesses of the natural oxides of all samples follow the same path and stabilize near 1 nm at room temperature, regardless of the chemical kinetics of the different bonds, as determined by spectroscopic ellipsometry.;Real-time measurement during SHG experiments is achieved by analyzing SHG anisotropy data with the anisotropic bond-charge model of nonlinear optics where peaks in the SHG spectrum are correlated with the near alignment of bonds to the direction of the excitation field.