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Plasma assisted synthesis and physical chemical characterization of titanium-nitride films

Posted on:1989-12-28Degree:Ph.DType:Thesis
University:University of California, BerkeleyCandidate:Hilton, Michael RobertFull Text:PDF
GTID:2471390017955912Subject:Engineering
Abstract/Summary:
The physical and mechanical properties of titanium nitride films synthesized by radio-frequency plasma-assisted chemical vapor deposition onto M2 tool steel were investigated. Titanium tetrachloride (TiCl;Films formed at temperatures lower than 400;Other deposition parameters, such as power, gas flow ratio, and substrate bias primarily influenced growth rates. The presence of a plasma enhanced TiN synthesis from TiCl...
Keywords/Search Tags:Plasma, Synthesis, Physical, Chemical, Titanium
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