Micro-nano 3D Lithography Technology Based On Two Beam Laser Direct Writing Platform

Nowadays,high-precision 3D lithography is the core technology in the micro-nano fabrication.At present,most mature products of high-precision 3D lithography are owned by foreign manufacturers,and core codes and technologies are completely closed-source.This is a key area of neck sticking in China,and there are quite a lot of problems to be solved.Two beam laser direct writing uses the two-photon polymerization effect of special photoresist.By controlling the spatial position of laser focus and laser power,the photoresist cross-linking reaction occurs at the focus,so as to realize true three-dimensional lithography.The laser resolution is further improved by the difference of photolithography effect between stimulated light and suppressed light.The existing research on the dual beam laser direct writing technology mainly focuses on the improvement of the resolution of laser direct writing,or for the 3D lithography of a specific model,lacking a more general analytical planning method for the 3D model.In addition,the research on the control and related optimal parameters of the dual beam laser direct writing in the actual operation is relatively lacking.Therefore,based on the dual beam laser direct writing platform,this paper proposes a general hierarchical analysis of the three-dimensional model.Path planning is carried out according to the characteristics of dual-beam laser direct writing platform.At the same time,the 3D lithography control system is completed.Finally,the actual effect of three-dimensional lithography is verified by practice.The main work of this paper is as follows:Analytical planning method for micro nano 3D model:The analysis of the three-dimensional model is completed,and the actual micro-nano lithography path in the dual beam laser direct writing platform is planned.In this paper,STL format is used as the format to describe the 3D model.The methods are divided into model reading and parsing module,Slice module,Polygon synthesis module and path generation module.The reading,layering,slicing,synthesis contour and path planning of the 3D model are completed.Micro-nano 3D lithography control system:3D lithography control system of dual beam laser direct writing platform is developed.The 3D lithography control system of dual beam laser direct writing platform includes read conversion module and hardware writing module.By controlling the laser galvanometer,piezoelectric platform,acousto-optic modulator and other optical precision devices,the displacement control of laser focus in three-dimensional space and the change of laser power are completed.Experimental verification of micro-nano 3D lithography:The parameters of the dual beam laser direct writing platform in micro-nano three-dimensional lithography are adjusted.The optimal values of lithography speed,laser power,layer height and other parameters are obtained by orthogonal contrast experiments of multiple control variables.The micro-nano three-dimensional lithography results with stable three-dimensional structure and perfect three-dimensional model details are obtained.