Study On Electrochromic Properties Of Ni_xO_y Thin Films Deposited By Glancing Angle Magnetron Sputtering

Nix Oy is a common material used in anodic inorganic electrochromic devices.However,it still has many disadvantages,such as long response time,small range of optical modulation and poor cycling stability.In order to solve these problems,Nix Oy thin films were deposited by DC reactive magnetron sputtering technology under different oxygen partial pressures,glancing angles and substrate temperatures.The electrochromic performances of Nix Oy thin films were inproved by controlling the surface/section morphology and crystal structure.First of all,studying the influnce on the electrochromic performance of Nix Oy with oxygen partial pressure.The results showed that the thin film deposited at the oxygen partial pressure of 0.05 Pa had its surface more loose and with more porous structure that increased the reaction area between ions/electrons and the electrolyte,enhanced the charge capacity,had a larger storage capacity per unit area.The diffusion rate of ion injection/extraction was increased and the response time of was lower at oxygen partial pressure of 0.05 Pa,the optical modulation range,optical density change and color efficiency of the film were all higher than those of the film deposited at other oxygen partial pressure.Secondly,exploring the influnce on the electrochromic performance of Nix Oy with glancing angle ?.The results showed that the thin film deposited at the glancing angle of ?=80° had a larger porosity on the surface and its section of inclined column structure was more obvious which greatly improved the unit charge capacity and ion diffusion rate,solved the problem of long response time of Nix Oy thin film,significantly improved its electrochromic performance.Finally,studying the influence on the electrochromic performance of Nix Oy with substrate deposition temperature.It found that the thin film was partly crystallized while the substrate temperature reached 150?,the internal degree of order of the thin film at 150? was increased and its defects was decreased,the degree of the crystallization of the film was improved the thin film generate amorphous at the temperature was continued to ascend to in excess of 200?.The electrochemical performance of thin flim deposited at 150?,it significantly improve the cyclic stability of thin film and its optical modulation range,then the film shows higher color efficiency than the amorphous film,it solved the problem that Nix Oy thin film has small optical modulation range and poor cycling stability.