Investigation On Structure And Photocatalytic Properties Of CuO_x Thin Films

In the 21st century,along with the people's quality of life and the progress of science and technology,how to deal with the pollutants in the water has become a big problem to people at the present.The discovery and the research of photocatalytic technology has become one of the main effective method which can deal with pollutants.Photocatalytic technology using films as the catalyst is more convenient.Among many catalytic materials,copper oxide film as a photocatalyst has a better and broader prospectsIn this thesis,different oxides of copper are prepared by glancing angle magnetron sputtering.It is necessary to study systematically the effects of sputtering power,deposition temperature,sputtering pressure and substrate bias on the microstructure and properties of the films,so as to prepare films with excellent performance.In this thesis,different series of copper and cuprous oxide composite films,cuprous oxide films and copper oxide films were prepared on ITO quartz glass substrates.The results show that when the argon-oxygen ratio is 30:1.7 and the sputtering temperature is 300?and 400?,the morphology of the film is similar to that of the granular film with large specific surface area,and the ratio of cuprous oxide to copper content was found to be 1:0.5.The films show the best photocatalytic performance.The photocatalytic performance of the film is improved by the presence of an appropriate amount of copper elemental substance.The photocatalytic degradation efficiency of the film is 92%in 2h reaction time.The copper content in Cu-Cu₂O composite film increased with the increase of sputtering power,and the photocatalytic performance of the film deteriorated with the increase of sputtering power.When the sputtering pressure is 0.4Pa,the content ratio of Cu₂O to Cu is 1:1.275.Due to the excessive Cu element in the film,the photocatalytic performance of the film is the least.When the ratio of oxygen to argon is 30:2.2,with the increase of the sputtering bias,the film changes from Cu₂O to Cu₂O-CuO composite film,and the film becomes denser with the increase of the sputtering bias.When the sputtering bias is-120V and-160V,the film is quite dense with small specific surface area,which leads to the worst performance.When the ratio of oxygen to argon is 30:5,the pure phase CuO films are prepared by changing the sputtering temperature.With the increase of sputtering temperature,the strength of CuO(002)peak becomes weaker,and the photocatalytic performance is positively proportional to the crystallinity of CuO(002).The stronger the(002)peak is,the excellent photocatalytic performance of the films will be.With the increase of sputtering temperature,the particles become larger and the film becomes denser.