Study On Suspension Polymerization Of Photoresist Resin And Its Properties

The photoresist is the basic process of integrated circuits research materials,with the large-scale development of integrated circuits in recent years,photoresist research and development and application become popular.One of the important components of a photoresist is the main resin.The traditional preparation of the main resin was mostly polymerized by free radical solution,which may lead to the extensive use of organic solvents,environmental pollution,and waste of resources.In this paper,photoresist resin was prepared by suspension polymerization using polyacrylate as the dispersant,and the properties of photoresist were studied.Specific research contents are as follows:(1)Using methoxy polyethylene glycol acrylate(PMEA)and acrylic acid(AA)as monomers,azo diisobutyronitrile(AIBN)as initiator,and acetone as solvent,the water-soluble polyacrylate dispersant was prepared by free radical solution polymerization.The structure and thermal behavior of the dispersant were analyzed.The synthesis conditions of dispersant were determined as follows:reaction temperature 65?,reaction time 10 hours,theoretical solid content 45%.The effects of neutralization degree and initiator dosage on the properties of dispersant were investigated,and it was found that the polyacrylate dispersant(PD-4)synthesized with a neutralization degree of 30%and an initiator amount of 3%has the best performance.,and will be used for the subsequent synthesis of the main resin.(2)The main photoresist resin was prepared by free r adical suspension polymerization using methyl methacrylate(MMA),butyl acrylate(BA),and methacrylate(MAA)as monomers,azo diisobutyronitrile(AIBN)as initiator and self-made polyacrylate dispersant,and the structure of the resin was analyzed.The synthesis process and formula of the resin were optimized.The results showed that the best process was 70? reaction for 6 hours,then 80? reaction for 2 hours,and finally90? reaction for 2 hours.The effects of the amount of initiator and the content o f methacrylic acid on the properties of the main resin were investigated.(3)The photoresist main resin,active diluent,photoinitiator,and solvent were mixed evenly to prepare the photoresist film respectively,and the structure of the photoresist film was analyzed.It was found that acetone was the best solvent for the main resin.The influence of molecular weight and carboxyl content of main resin on the properties of photoresist film was investigated.The influence of the type and dosage of active diluent on the properties of photoresist film was investigate.