Study On The Monitor Of Magnetron Sputtering State Based On The Plasma Optical Mmission Technology

With the development of modern technology,various functional films have been increased and applied in various fields.And the magnetron sputtering technology is a very popular technology for its characteristics such as low deposition temperature,great film adhesion,great uniformity,high density,low impurity,and the thickness of film can be controlled and operated easily.Magnetron sputtering coating technology can also be used to prepare the material,semiconductor materials and insulating materials.Therefore,it has been widely used in recent years.However,the process of magnetron sputtering coating technology has always been highly dependent on the process of the coating technics and lacks necessary monitoring methods.In order to improve the optimization of the technology of magnetron sputtering deposition,this paper adopted the spectrometer replace the human eye to diagnose plasma emission spectrum in a vacuum chamber,the plasma spectra was studied in the process of coating.Based on the plasma optical emission technology,this paper developed a system for monitoring the magnetron sputtering emission spectrum by using the spectrometer as the monitoring equipment,and the corresponding interface was written.The emission spectrum of magnetron sputtering is monitored in real time.Through the monitoring of the spectral intensity of each component in the preparation of alumina by magnetron sputtering,the curve of plasma intensity with the change of parameters is obtained.Through the spectral monitoring of the pre-sputtering phase,the characteristic spectral line of aluminum is very weak at the initial stage of pre-sputtering.As the presputtering time increases,the characteristic spectral line of aluminum begins to increase,increasing the trend from fast to slow,until finally stable in a more stable area.The process of achieving a stable process from the initial sputtering to aluminum is defined as pre-sputter time.It is found that increasing target power increases the time of presputtering;When the pressure is 0.5-4Pa,the increase of working pressure can reduce the presputter time;When the pressure is greater than 4Pa,increasing the pressure increases the presplash time.In the monitoring of the leakage of magnetron sputtering by optical emission technology,this method has been found to be sensitive and effective,and it can detect the leakage phenomenon of 0.1sccm air leakage in time.The two peaks with the most obvious and undisturbed spectral line changes were found,and the peak values were 395.5nm and 531nm respectively.Preparation of alumina in radio frequency(rf)magnetron sputtering process,the preparation process of using the spectrometer to spectral analysis,preparation of rf sputtering aluminum under spectral lines and the relation curve of oxygen gas flow,was obtained under the condition of rf magnetron sputtering target poisoning.Through this curve,the process of preparing alumina has been guided,and the coating process has been successfully controlled in the working point and obtained good alumina coating.