Research On The Design And Implementation Of Photolithography Innovation Strategy In China

The Twentieth National Congress of the Communist Party of China clearly pointed out that "we will resolutely win the battle against key core technologies,and promote economic and social development by relying on high-level science and technology." It can be seen that breaking through key core technologies has become an urgent task of innovation driven development strategy.After more than 50 years of development and innovation,China’s photolithography technology,on the basis of verifying the correctness of Moore’s Law,also continues to lead the progress of the integrated circuit industry and chip industry.However,in the global scope,China’s lithography field is still in a backward state,which hinders the progress of China’s integrated circuit industry.Therefore,the problems of China’s lithography technology need to be solved urgently.Especially in the context of "choke",it is of great practical significance to design and implement China’s lithography technology innovation strategy by using the patent measurement method.This paper first reviews the key core technology theory,the technology competition situation based on patent measurement,and the related research on technology innovation strategy.On this basis,it analyzes the global development of lithography technology and the development status of China,and demonstrates the necessity of China’s design technology innovation strategy.Based on the innovation value chain theory,this paper analyzes the influencing factors of China’s lithography technology innovation strategy,and identifies the influencing factors of China’s lithography technology innovation strategy from four aspects: R&D capability,talent structure,innovation subject characteristics,and innovation external environment.According to the principles of systematicness and scientificalness,the index system of influencing factors of lithography technology innovation strategy is established,and the influencing factors of China’s lithography technology innovation strategy are evaluated by using the gray correlation analysis method.Based on the development status of lithography technology and the theory of innovation value chain,the strategic positioning of leapfrog technological innovation is determined,the goal of lithography technology innovation strategy is defined,and the technology research and development strategy based on industry university research cooperation and the incubation and derivative strategy based on government led research and development enterprises are designed,which together constitute the lithography technology innovation strategy.Finally,based on the lithography technology innovation strategy,the corresponding implementation strategy is proposed,and the guarantee strategy is given from four aspects of policy,investment,talent and indystry.The research on the design and implementation of China’s photolithography technology innovation strategy carried out in this paper provides decision-making and theoretical support for the innovation breakthrough of photolithography technology and the development of China’s photolithography technology field,which has a significant theoretical guiding role in promoting China’s innovation driven development strategy and breaking through the "bottleneck" dilemma.