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Molecular Beam Epitaxial Growth And Physical Properties Of MnTe2 Thin Films

Posted on:2023-12-14Degree:MasterType:Thesis
Country:ChinaCandidate:H Z WuFull Text:PDF
GTID:2568306782465974Subject:Physical Electronics
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Manganese ditelluride(MnTe2)is an important transition metal chalcogenide semiconductor,which crystal structure is pyrite structure.MnTe2is an antiferromagnetic semiconductor.Its Neel temperature TNis about 86 K.At this temperature,the second-order antiferromagnetic transition occurs;MnTe2also has a high Seebeck coefficient(~400μV/k)and low lattice thermal conductivity,showing high conversion efficiency in thermoelectric device applications.At present,the growth technology and basic physical properties of MnTe2films,such as electronic band structure,work function,electronic transition behavior and magnetic structure,have not been systematically studied.In this paper,we successfully fabricate polycrystalline MnTe2thin films on the two-dimensional layered mica surface by van der Waals via molecular beam epitaxy technology.By optimizing the flux ratio and substrate temperature,we continuously eliminated the impurities in the polycrystalline MnTe2thin films,optimized the surface morphology of the thin films,and overcome the difficulties of large-area epitaxy of thin films without hanging bonds on the surface of mica substrates and particularly low surface energy.The optical,magnetic and electrical properties of MnTe2thin films were systematically studied.Based on the weak bonding force between van der Waals epitaxial MnTe2films and substrates,the stripping and transfer of van der Waals epitaxial MnTe2films on mica substrates were realized,and MnTe2and Mo S2heterostructures were prepared.The surface work function of MnTe2was determined by UPS,I-V and KPFM.The main contents and results of this paper are as follows:1.By optimizing the van der Waals epitaxial growth process,the optimal process conditions for the growth of pure MnTe2thin films on mica substrates were obtained.Using XRD,AFM and Raman spectroscopy,it is found that the growth temperature,Mn/Te flux ratio,and the phase structure,growth direction and surface morphology of Mn-Te epitaxial system can be adjusted,so as to achieve a relatively flat and high-quality MnTe2polycrystalline film(RMS:~3.904 nm).High-resolution transmission electron microscopy shows that the interface between the film and the substrate is clear and the crystal epitaxy is of high quality.2.Through the characterization of UV-IR transmission spectrum and the Tauc relation,it is determined that MnTe2is a semiconductor with direct electron transition,and its band gap is1.39 e V.Using the modified Curie-Weiss relationship to fit the M-T curve,combined with the M-T relationship under field-cooling and zero-field-cooling conditions,it is found that MnTe2has a non-collinear antiferromagnetic structure,and its antiferromagnetic transition temperature is about 86.2 K.In addition,we also found a sudden change in the resistance of the MnTe2film in the 160 K region,indicating that there may be a structural phase transition around this temperature,which was further confirmed by temperature-varying Raman spectroscopy.3.Using different work functions metals(Pt,Cr,and Ti),the metal/MnTe2contact behavior and transport properties were investigated.The study found that the temperature range from160 K to 300 K,the I-V relationship showed good linearity,indicating that MnTe2formed ohmic contact with these metals,and the reasons why different metals and the prepared MnTe2films always maintained ohmic contact were analyzed.The work function of MnTe2was determined to be about 5.07 e V according to X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy.4.Based on the weak binding energy between the MnTe2/mica van der Waals epitaxy system,the exfoliation and transfer of MnTe2thin films were realized,and the MnTe2/Mo S2heterostructure was prepared,which exhibited typical diode rectification characteristics(RF~40),the heterointerface barrier inhomogeneity,which is consistent with the Werner-Gutler model.Through the fitting analysis of the I-V curves at different temperatures,the height of the MnTe2/Mo S2interface barrier is about 0.1 e V,and the work function of MnTe2is calculated to be 5.1 e V,which is confirmed by the KPFM.
Keywords/Search Tags:MnTe2 thin film, Van der waals epitaxy, Antiferromagnet, Optical bandgap, Work function
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