Research On Influencing Factors Of Forming Precision Of Dual UV Ozone Mask

The Double-UV ozone mask is a new method proposed to solve the existing digital micromirror photocuring difficulty in large-area molding,which uses short ultraviolet make closed oxygen and ozone complete transformation in the body,so as to realize the dynamic ozone mask,compared with the traditional mask making,this method improves the light energy utilization rate,more easy to realize large area shape.In order to realize the manufacture of ozone mask,the factors affecting the foming accuracy of this method were outstanding problems that need to be studied.Therefore,this paper focuses on the forming process of ozone mask and studies the factors affecting the forming accuracy of this method.The main work is as follows:(1)Based on Beer-Lambert law and critical exposure of resin,the concept of ozone critical mask concentration was proposed,and the mathematical relationship between ozone critical mask concentration and critical exposure of resin was established,as well as the calculation basis of mask thickness design.The main factors affecting the forming accuracy of this method were analyzed,including ozone mask concentration,heat and mass transfer in the mask and resin curing deformation.(2)The ozone concentration detection platform was built based on uv spectrophotometry.The kinetic process of ozone photolysis was discussed for the 254nm UV photolysis process.The effects of different temperature,initial ozone concentration and light intensity on the reaction rate of ozone photolysis were studied to reveal the rule of ozone concentration changing with time.(3)The diffusion process of ozone in quartz sealing mask under different boundary conditions was simulated.The variation curves of ozone concentration,diffusion flux and diffusion velocity in the masked and unmasked regions were solved,and the nonlinear equations were obtained to reveal the influence of temperature change on diffusion.The magnetic susceptibility coefficients of oxygen and ozone in the mask region were simplified,and the effects of gradient magnetic field on the natural convection velocity distribution and heat transfer intensity of mixed gas were investigated.(4)The curing of photosensitive resin is similar to that of liquid crystal mask in that the curing of liquid resin is realized by chain reaction triggered by initiator.Therefore,the LCD surface forming process is adopted to design a single factor experiment,from the exposure time,layer thickness,lamp time three factors,to study the size deformation rate of the molded parts,and through the orthogonal experiment and response surface method to obtain the optimal process parameters.