Research On The Measuring Method Of The Slope Error Of EUV/X-Ray Optical Elements And Measuring Apparatus Of The Long Trace Profiler

The technology on the processing and detection of the extreme-ultraviolet radiation and X-ray (EUV/X-ray) optical component is one of the main categories in modern short-wave band optical research. At present, EUV/X-ray optical component are in great demand on the construction of the rapidly developed synchrotron radiant lamp-house and beam of light engineering in developed countries. Now few countries has the ability of developing this kind of optical component with super-smooth surface and high precision and the key technology is processing and detecting technique.In this paper, the author study the measurement method and instrument of the EUV/X-ray optical component, improve the design of the measuring apparatus-long trace profiler LTP already existing, provide a kind of newly long trace profiler LTP-III, which is used to measure the slope error. At last, several assumptions are offered on the improvement and development of the measuring apparatus LTP-I1I.