| In recent years, the study of TiO2 , an important functional thin film materials , have made remarkable progress in basic theory and practical application. Some progresses have been wildly applied in solar cell, optical-electrical converter, wastewater treatment, air purification and cleaning and removing microorganisms etc.Light reflection on the silicon surface can make light loss reach up to one third. According to the thin film interference principle, if the silicon surface is coated with a layer of thin film, which will reduce light reflection remarkably, it can improve the efficiency of the optical-electrical conversion. TiO2 is a kind of ideal material on reducing reflection for solar cell. For energy resource problems all around the world, to apply nanometer TiO2, a high activity, high stability and high efficiency of ultraviolet absorption material, as a reducing reflection film is a ideal technology. The attenuation of performance on coating film has been existed, so the coated technology and reducing reflection has been paid more and more attention.Main researches for this thesis are included as follow:(1) Designing the device for low temperature PECVD and studying its operating characteristic.(2) The optimal condition of the process is groped. The influence of deposition rate by deposition temperature and substrate temperature and influence of optical performance of this film with different conditions is observed. Discovering the growth behavior of TiO2 thin film is controlled by dynamic or diffusion under different reaction conditions.(3) Characterization on structure and performance of the deposition film.(4) The optical performance of TiO2 thin film.In this paper, the preparation, structure and property of TiO2 thin film to reduce reflection by PECVD are studied with Til4 , argon and oxygen. And some laws that the technology how to affect the optical performance of this film are discussed. It is very important to applying on solar cell.
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