Study On The Removal Of Electroplating Organic Pollutants By UV-Fenton Reagent

it is very difficult to treat the electroplating organic wastewater due to its multiple species, high toxicity, low degradation and severe environment pollution. However, photocatalytic oxidation technology can degrade the organic pollutes existed in the dye wastewater to nontoxic and low toxic molecules. At the same time, this technology owns the advantages such as high efficiency, energy saving and without secondary pollution etc., and shows the good application prospect. So many researchers have paid their attention to this technology.In this paper, we selected three common electro-plating additives which were mixed into simulated wastewater. We compared the UV-Fenton system and the Fenton system which were used to treat the simulated wastewater. Through the changes of COD content of wastewater to study the best operating conditions by UV-Fenton system. The COD removal rate of action wastewater in the best condition of UV-Fenton system has been researched. Then, we added the oxalic acid root into the system and researched the effect.The UV process,Fenton process and UV-Fenton process were compared, the latter has advantages over the latter because both the Reagent utilization and the COD removal values obtained from time latter are higher than that obtained from the formers. The disposal curve of COD through the said process treatment followed the first order kinetic equation, Ultraviolet and Fenton reagent had the best-performing synergy effect. The best operating conditions of UV-Fenton process were determined as that the amount of H2O2 at the equivalent of COD, the Fenton reagents proportion(Fe2+:H202)about 1/10(molecule ratio), 6min reaction time, and the pH of waste water was 5.Action wastewater also had better degradation effects by UV-Fenton system. The COD removal rate was over 72% in the best operating conditions which was higher about 12% than Fenton system. When the COD removal rate was same, the H2O2 requirement of UV-Fenton was lower about 4ml/L than the one of Fenton, and the Fe2+ requirement was less than half of Fenton system. Adding oxalic acid root into the UV-Fenton system would still could raise the utilization rate of hydrogen peroxide, besides improving the COD removal rate. Meanwhile, it could broaden the pH range of UV-Fenton system.