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Impurity Diffusion Of Al And Si In The Supercooled Liquid State Of The Cu 44.25 Ag 14.75 Zr 36 Ti 5 Bulk Metallic Glass

Posted on:2012-01-21Degree:MasterType:Thesis
Country:ChinaCandidate:C H WuFull Text:PDF
GTID:2131330335966708Subject:Materials Physics and Chemistry
Abstract/Summary:PDF Full Text Request
In this work, we study the Cu44.25Ag14.75Zr36Ti5 round rod object of the bulk amorphous alloy with a diameter of 3mm and a height of 1mm and know Al and Si with the impurity diffusivity in the supercooled liquid region of Cu44.25Ag14.75Zr36Ti5 bulk amorphous alloy and in order to clarify the atoms of the diffusion mechanism in the supercooled liquid region.Al and Si film were made a good round on the cutting circular cross-section of rod-like through the Magnetron sputtering machine. In this process, we must ensure that the temperature can not be too high(< 3000C) and in a vacuum environment, because only then can ensure that the amorphous alloy neither oxidized nor the sample, which was crystallized. Secondly, a good film is on the plating of samples at different temperatures and time in the diffusion annealing, only chose three temperatures and time, they were (680k,0.5h), (660k,1 h), (640k,2h). After that they are still amorphous XRD detection. Finally, a good sample after diffusion annealing through the using of secondary ion mass spectrometry (SIMS) and the level meter, they were found that Al and Si atoms in the supercooled liquid region between the diffusion coefficient and temperatures are in line with the same Arrhenius relationship and are a collaborative multi-atom diffusion mechanism. Suggesting that they were the same in the supercooled liquid region of the diffusion mechanism, in addition, Al and Si atoms of the diffusion coefficient are increasing form the increasing of temperature.In addition, the average diffusion coefficient and diffusion activation energy of Al and Si were calculated by Fick,s law. they were 2. 6×10-12m2s-1, 1. 9×10-11m2s-1 and 2 .95eV, 2 .46eV respectively. the diffusion activation energy between them was found that they are not much different, because Si atom is non-metallic element, but it is very strong in the substrate metal atoms so that the diffusion activation energy became much larger.
Keywords/Search Tags:Cu-based amorphous alloy, diffusion annealing, secondary ion mass spectrometry, level meter, atomic diffusion mechanism
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