The Development And The Key Technological Research On Roll To Roll Nano-imprint Experimental Platform

As a replicating technology, nanoimprint lithography (NIL) has the advantageof high resolution, high thoughout and low cost for nano-patterning fabrication,opening up a large range of applications. It has been brought into InternationalTechnology Roadmap for Semiconductor (ITRS), becoming one of representativetechnologies in the22nm node fabrication. However, in conventional nanoimprint,the photoresist is imprinted by the whole mold at one time and only replicate onepatterning through a process. The throughput is still far from meeting the demandsof industrialization. Meanwhile, for replicating large area nano-patterning, it needsvery high force in imprinting and demolding process. Moreover, the mold and thepatterning on resist layer can be destroyed easily. Taking the advantage of flexiblemold, a new technology named roll-to-roll nanoimprint lithography (R2RNIL) ispresented in this article. By imprinting and demolding partly, it can replicatenano-patterning continuously at low pressure.Firstly, the process of R2RNIL is introduced and the material of template,photoresist and the substrate in R2RNIL are discussed. Then, a roll-to-rollapparatus is designed to replicate different resolution of nano-patterning onpolymer resist which is coated on PET.Demolding is the key process in R2RNIL. There are sorts of defects such asabrasion, crack and deformation which may appear in the process. Firstly, thedemolding ways in R2RNIL are analyzed. Secondly, the condition to successfuldemolding is calculated through surface theory. The size of forces to peel offparallel and sidewall contact surface are calculated. Lastly, the stress distributionon contact surface during demolding is simulated via finite element analysis.A new technology and system to fabricate fluidic nano-channel on polymerlayer continuously is developed by combining R2RNIL with plasma polymerization.The technology is demonstrated by experimental result.