Study The Performance Of TiAlN Film And Its Preparation By Unbalanced Magnetron Sputtering With Ion Plating

Hard coating in the machinery industry,mainly used for surface strengthening of cutting tool,die and wear resistance corrosion resistant parts.Hard coating can significantly improve the service life of the tool,mould and the quality of the processed parts.TiAlN coating has the advantages of high hardness,good red hardness,high oxidation temperature and strong adhesion,which is widely applied in mechanical industry.In recent years,there has been a lot of methods to the preparation of the good performance of TiAlN coatings,but we can further improve on the process parameters of coating preparation to get better coating performance.In order to achieve the preparation of the excellent performance of TiAlN coatings,it's necessary to study the preparation technology and the related process parameters design.This article used the intermediate frequency unbalanced magnetron sputtering technology to produce TiAlN film,found out the optimum process of plating system to deposit the excellent properties coating.The influence of each test parameters on the mechanical properties of TiAlN film,including dc bias,ionization power,sputtering power and deposition time,were studied by orthogonal test method.Sample of the best testing scheme was taken as reference,according to this,the influence of the three parameters,such as dc bias,ionization power,sputtering power,on the fracture surface morphology,the film composition and phase structure of TiAlN film were studied.The main performance of film,such as hardness,adhesion,phase structure,fracture morphology and others,were tested and analysised by microhardness tester,scratch tester,metallographic microscope,XRD,SEM and EDS instruments respectively.TiAlN film as a hard coating is condutive to the surface strengthening of processing tool,we take its hardness and adhesion as the main identifying criteria of cutting performance.The orthogonal experiment results indicate that the sputtering power play a decisive influence on film hardness,the ionization power has a great influence on the adhesion of film.And adopting appropriate bias,ionization power,sputtering power and deposition time in the plating conditions to obtain superior performance of thin film is necessary.Through the analysis of film fracture surface morphology and phase structure showed that,with the increase of bias within a certain range,film have the compact structure of organization,formed the mutual diffusion structure with basal surface,and have no obvious boundary layer;And with the increased power of ionization and sputtering,there is more tiny grain in the formation of film,and the section is more smooth level off.EDS spectrum analysis results show that the sputtering power has a larger effect on the content of Al,with the increase of sputtering power,Al/Ti increased gradually;XRD analysis found that in four groups of samples detected the AlN phase,the thin film structure in(111)crystal plane orientation have significant high growth advantage,the higher value of I(111)/I(200),the greater the diffraction peaks of the TiN shift to higher angle and its lattice constant decreases as well.