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Synthesis Of BiVO4-based Photoanode Materials And Research On Their Photoelectrochemical Water Splitting Performances

Posted on:2019-06-26Degree:MasterType:Thesis
Country:ChinaCandidate:X J WangFull Text:PDF
GTID:2371330566994317Subject:Physical chemistry
Abstract/Summary:PDF Full Text Request
Bismuth vanadate?BiVO4?,as a semiconductor photocatalyst,with its suitable band gap,conduction band,valence band position and good chemical stability,is widely used in the fields of photocatalysis and photoelectrocatalysis.However,BiVO4 has a limited optical activity due to its low photo-generated charge transfer efficiency and high photo-generated electron-hole recombination rate.Therefore,in this paper,we studied about the improvemnet of the defects of BiVO4 photoanode materials.The g-C3N4/Mo:BiVO4 and NiOOH/PANI/BiVO4 photoanode materials were prepared on the FTO substrate,which enhanced the photoelectrochemical?PEC?water splitting performance of BiVO4.The main contents are as follows:?1?g-C3N4 was successfully loaded on the surface of Mo:BiVO4 to structure an integrated CMB photoanode via a facile impregnation method.The remarkable water oxidation photocurrent of CMB photoanode achieved 3.11 mA cm-2 at 1.23 V vs.RHE under AM 1.5G solar light irradiation,the maximal incident photon-to-current conversion efficiency?IPCE?achieved 45.5%at 430 nm and the maximal applied bias photo-to-current efficiency?ABPE?reached 0.74%at 0.80 V vs.RHE.Moreover,the photocurrent of the CMB photoanode only decreased slightly by 0.18 mA cm-22 after 1hour of continuous water splitting,confirming the great stability of CMB photoanode.These enhanced PEC water splitting performances were mainly attributable to the Mo doping increased the carrier concentration of BiVO4 and improved the electron-hole separation efficiency.On the other hand,the formation of g-C3N4/Mo:BiVO4heterojunction accelerated the separation of electrons and holes and effectively inhibited the recombination of carriers.The photoanode materials designed in this work would have a high application prospect for the design and development of new type of photoanode in the future.?2?Polyaniline?PANI?hole-transporting layer was successfully inlaid between the BiVO4 core and the NiOOH shell to structure an integrated NPB photoanode via a facile photoelectrodeposition method.The remarkable water oxidation photocurrent of NPB photoanode achieved 3.31 mA cm-2 at 1.23 V vs.RHE under AM 1.5G solar light irradiation,which was greatly increased compared with that of pristine BiVO4(0.89mA cm-2 under the same condition).The maximal IPCE achieved 83.3%at 430 nm at1.23 V vs.RHE and the maximal ABPE reached 1.20%at 0.68 V vs.RHE,which were nearly five and ten times higher than that of pristine BiVO4 photoanode,respectively.This NPB photoanode exhibited excellent stability with about 97.22%Faraday efficiency after PEC water splitting for 3 h.The exciting results demonstrated that PANI showed great potential as a hole-transporting layer for photoanode and NPB was an efficient and stable photoanode material with a great potential application in PEC water splitting.Overall,this work provided an excellent reference on designing and fabricating photoanode materials for the future.
Keywords/Search Tags:BiVO4, Photoanode, Photoelectrochemical water splitting
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