Several Key Techniques On Instrumentation Of X-ray Beamline And Ion Beam Etcher For Large-aperture DOE

Large-scale scientific facilities based on particle transport have been developed widely all over the world recently, especially of synchrotron radiation(SR) and Inertial Confinement Fusion(ICF). Related non-standard instrumentation, most of which are integrated and precision system with multidisciplinary approach, plays a critical role in the engineering implement.Several key techniques on the development of the SR X-ray beamline instrument and the scanning ion beam etcher with linear radio frequency(RF) source for fabrication of large aperture diffractive optical elements(DOE) are presented. It is includes two main aspects:1) NSRL X-ray beamline main instruments. According to the characteristics of the 6T single-period superconducting wiggler source, discussion on the thermal equilibrium process of the heating effect on optics (U7C double crystal monochromator, U7B bent cylindrical mirror) is presented. A testing method and the results of thermal effect on photon flux of DCM are introduced. Temperature distribution and thermal strain for both steady and transient cases with radiation cooling alone and with a combination of radiation and forced convection cooling are considered by finite element method (FEM). Methods and performance of linkage mechanism for DCM, bender & adjustment device for focusing mirror are presented and discussed.2) Development of KZ-400 ion beam etcher. With a 6cm×66cm rectangular beam which the substrate carriage traverses back and forth, an area can be over-covered as large as 40cmx40cm. The Operating principle, construction features of the etcher, commissioning results and technical performance are presented, especially of the vacuum system with a large block chamber, workbench assembly with X,Y-translation and Z-rotation, and a scanning faraday-cup based current density detecting system. A beam diaphragm is adopted to optimize the ion beam spatial uniformity, and excelling 5% uniformity along the major axis is achieved. Etching experiments shows a good uniformity of 5.4% of etching depth over the 40cm.At last, the similar problems of instrumentation related to the beam tracing are discussed and summaried: the simulation and measurement methods with a certain energy and distribution as well as the heating effect on optical surfaces, and the design methods of structures with tiny motion or displacement for compensation of the adjustment to meet the requirement of performance. The improvement and possible application of the methods, for the more precision instrumentation of the incoming demand, are also taken into account in brief.