The Influence Of Several Kinds Of Ions On The Electrochemical Behavior Of Anodic Alumina Films

Commercial pure aluminum L3 was implanted by Ti ions and then anodic oxidation was carried out. XPS analysis revealed that Ti is present in the anodic film as TiO₂. The XRD investigations proved that Ti ions implantation does not lead to the formation of a crystal state. The EIS results show that anodic oxide films implanted by Ti ions provide relatively higher corrosion resistance both in acidic and in basic solutions. After implantation of Ti ions, the R values increased and the C values decreased, which showed a more difficult penetration of the aggressive electrolyte into the anodic oxide film on the L3 aluminum and its less porosity.The influence of Ni ions implantation on corrosion resistance of anodic films on aluminum was studied. Atomic force microscope (AFM) observations show that the implantation of Ni ions makes the surface structure and morphology of anodic films more uniform. XPS analysis reveals that Ni is present in the states of metallic Ni and NiO on the surface of the anodic film. Electrochemical results show that anodic films with Ni ions implantation provide relatively higher corrosion resistance both in acidic and in basic solutions. Ni ions implantation mainly affects the property of porous layer, which is characterized by the capacitance C_p and the resistance R_p After Ni ions implantation, R_p values increased and C_p values decreased, which shows a more difficult penetration of the aggressive electrolyte into the anodic film. The concentration of Ni and formation of NiO on the surface of anodic film, which block the pores in the film, should be the main reason for better corrosion resistance of the implanted samples. The semi conductive property of anodic films in basic NaCl...