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Research On Block Copolymer Thin Film With Self Assembled Ordering Nanostructure

Posted on:2007-01-21Degree:DoctorType:Dissertation
Country:ChinaCandidate:Y Z CaoFull Text:PDF
GTID:1101360212970120Subject:Mechanical Manufacturing and Automation
Abstract/Summary:PDF Full Text Request
Materials with well ordering of nanostructure have been seriously considered for nanotechnological application because of its fancy physical phenomena and the relation to quantum photoelectric component in the future. The use of tensorial physical properties of materials with well ordering of nanostructure will provide utilization in nanotechnologies including nanostructured membranes, nanoparticle synthesis, photonic crystals, and high-density information storage media. In order to realize these applications, control over nanostructure spatial and orientational order with low cost is paramount. With the development of the nanometric science and technology which acts as an advanced and crossing subject, block copolymer self assembly technology become a key means for achieving well ordering nanostructure. Particularly, they will be the base of nanometric quantum photoelectric devices.However, without the more restriction, the orientation of the nanodomains is not perfect and the structure shows fingerprint pattern. Furthermore, the grain size is insufficiently large. So, the main challenge of using block copolymer thin film with self assembly nanostructure lies with control of the nanostructure. Achievement of precise microdomain location, orientation, and elimination of various defects requires introduction of external fields during the processing step. Moreover, the combination of top-down and bottom-up manufacturing process for nanostructure is the hotspot in the domain of micro/nano manufacture. So the research of a subject has very important meanings in both experiment and theoretics.At first, this subject will study the mechanism of block copolymer self assembly on the base of kinetics and thermodynamics of block copolymer microdomain separation. In order to establish the foundation of controlling and freezing block copolymer self assembled nanostructure, the effect on self assembled nanostructure induced by temperature, concentration and selective solvent has been analyzed qualitatively.
Keywords/Search Tags:Self assembly, ordered nanostructure, atomic force microscopy, block copolymer, nanoindentation
PDF Full Text Request
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