The Research Of Duplicate Precision About Nanoimprint Lithography

Along with the decrease of integrated circuit's critical dimension, conventional projection lithography is facing the problem of cost and technology, becoming one of difficult science research problems to be solved in the world .Conventional theory may no longer apply and new phenomena emerge, nanoimprint lithography. It has the advantage over conventional nanofabrication methods, high resolution, low cost and high throughput, suitable for industrial production.Although nanoimprint lithography has great advantage and prospect application, the nanometer stamping craft processing object is the nanometer level pattern structure, its operation object extremely precise. Therefore each step of technological process has the approximate strict request to the equipment and the operation, the technical content is very high, also this new technical itself still was in the development earlier period, many technical difficult problem should be solved, such as stamp design and fabrication; anti-sticking technology; physical and chemistry performance of resist; the thickness and uniformity of transfer layer.Multifarious nanoimprint lithography techniques are described in the paper. All these techniques are classified according to their process and principle. Their advantages and disadvantages are shown. Mainly, do research in room temperature lithography.Research in the principle and process of nanoimprint and duplicate precision related to many different causes: method of stamp design and fabrication; anti-sticking technology; physical and chemistry performance of resist; the thickness and uniformity of transfer layer.According to alignment requirement, design the dual level precise positioning system and the performance analysis; dynamics analysis, dual stage system control model, analyzed the system design parameter to the ultra precise positioning system; finally confirm that the system has achieved the precision.In the area of controller design, the paper uses increment PID method, nerve cell self adaptive PID method to control linear motor and micro table.designs a sliding adaptive controller for the total macro-micro system. Nerve cell is the basic cell of neural net, it has self learning and adaptive ability, the algorithm is easy to calculate. The traditional PID adjuster has a simple structure, it can be easy to adjust, its parameter adjustment has a great relationship with engineering index, but its arameter can not be adjusted in real time and it also can not have a satisfying effect in controlling complex processing or time slow varying system. The combination of two method can solve these problems.At last, the comparison and analysis of experimental results validated the feasibility and advantage of dual-driven technique, the dual active high speed high precision robot has performances of large displacement, high precision, high speed, high resolution.In the paper, study of other two technologies which directly influence nanoimprint duplicate precision, namely stamp and transfer layer template technology, including the method of stamp design and fabrication; anti-sticking technology; physical and chemistry performance of resist; the thickness and uniformity of transfer layer; Finally do a lot of experiments about room temperature lithography to prove the principle.Through the orthogonal experiment, it has confirmed that dual level precise positioning system is validity and the feasibility, the duplicate precision is high. After the leveling, stamping duplicate design clear, keeps film thickness evenly, the stamping duplicate precision is high; the control optimizes aims at the precision to be possible to reach 245nmTake room temperature lithography process as the basis, closely revolved to enhance technologies which directly influence nanoimprint duplicate precision, namely stamp and transfer layer template technology, including the method of stamp design and fabrication; anti-sticking technology; physical and chemistry performance of resist; the thickness and uniformity of transfer layer;Establish the mathematical model of transfer layer thickness and the spin coating process.In to the stamping duplicate precision influence factor generalized analysis foundation in, withdrew influence to be big, to have a condition controllable dish factor, in the application mathematical statistic experiment design orthogonal experiment design law, take these 7 influences factor as the orthogonal experiment factor. And has carried on the analysis with in the data analysis and the theory of error range analytic method to the experimental result, has obtained various factors to the stamping duplicate precision target influence size order, explained factor when experimental scope value, causes the stamping duplicate precision (experimental target) the value change to be biggest; Simultaneously obtained various factors, the level to the stamping duplicate precision influence change tendency.Finally do a lot of experiments about room temperature lithography to prove the principle. Obtained a set of stampings duplicate precisions, after the optimization, obtained on the silicon base pattern have been smaller than 10% duplicate precision.In the finality, the problems requiring further studies are discussed.