| Printing electronic technology is the combination of printing technology and electronic technology,developing rapidly with the developments of display and touch screen industries.Photoresist and its composites,which are essential materials for the printing electronic technology,have been adopted in various electronic manufacturing fields.In the future,the requirements for accuracy,resolution,intergraton and the complexity of line graphics will be increasingly higher.High-accuracy photoetching material and the relevant yellow-light technology will be a key element in promoting the development of our national electronic industry.The purpose of the the present research is to develop a UV light-cured photoresist and the relevant composites by combining pigments,quantum dots and nanometerconductive materials verified by printing yellow-light process.The present research intends to design a quaternary monomer solution copolymer resin by composing methacrylic acid,N-phenyl maleimide,methacrylic acid isobornyl and styrene in accordance with Fedors Incremental Method.It designs a orthogonal experiment form which is to be characterized by FT-IR and GPC.According to the solubility of monomers in polymerization,with the weighted mean value controled within 10-11(cal/cm3)1/2 while weight-average molecular weight between 12000-15000 and Mz/Mw below 2.0,it selects(9),(15)and(17)these three samples.The above samples will be made into a new insulated negative photoresist with the other groups and characterized by DSC.The photolithography will be conducted on the touch screen to test its functions at high temperature(280oC)as well as high humidity(93(+2/-3)%RH).The result reveals that the touch screen's light transmittance is 96%,performing better than South Korea's SMS-6200 H.The research then chooses(15)yellow-light resin to make negative photoresist.It makes line graphics with 5 um's trace widths and trace spacing through photolithography experiment and makes it characterized by SEM.Then it uses coating equipment to evaporate a 1.2-1.3um-thick elemetary gold film in vacuum and gets rid of the photoresist and the elemetary gold on it with stripping solution to make the pattern with 5 um's trace widths and trace spacing.The line graphics will be characterized by three dimensional metallographic microscope.In the research,we compose nanometer and super dispersant to make red,green and blue nanometer dispersant liquid in accordance with anchor super disperse theory,and then use a spectrophotometer to test their chromatic value and Marvin particle analyzer to test their stability of dispersion.Based on this,we,according to the requirement of CF colorimetry and white balance,make R,G and B these three colors' negative photoresist of respective coordinates,among which yellow-light resin adopting OC photoresist's heat-resistance yellowing and(15)sample whose CD has been well-controled.CD,CD Bias,Thickness Uniformity,Color gamut,Profile Analysis and Defect Analysis of R,G and B's color photoresist will be tested on yellow-light process line and then compared with Japanese Fuji Film's color photoresist.We arrange the pixel and align R,G and B these three colors' photoresist on glass substrate with black matrix.Compared with Fuji Film's CF which is made by RGB color photoresist,NTSC's standard color area reaches 63.7%,which is more than Fuji's 60.7%.We compose a kind of resin including alycyclic aromatic as the grinding-type resin and put it on the quantum dots and the mixture of organic pigments to improve the dispersability of the quantum dots.And to be adapted to the low-polar solvent system,we compose a kind of bisphenol modified-acrylic yellow-light resin(Mw:18398;Mz/Mw:1.9)and let it be characterized by GPC and R.It can be used to make color photoresist's composite in the chloroform solvent with quantum dots and the other materials.We make quantum-dot color filter with the technology used in making CF with color photoresis,and measure the saturation of colors stimulated by blue light LED.The result shows that NTSC's standard color area reaches 126.9%.To start with nanometer gold sphere,the present research explores PoPD's dispersibility on nanometer gold sphere,and characterize the disperse microsphere by using SEM,TEM,XRD,FT-IR,Raman,XPS and UV-VIS.For the prepared hollow microsphere in PoPD@Au,the experiment shows that Au nanometer particles have been successfully modified on the surface of the microsphere.The electrode which adapts the above microsphere for chemical modifications shows the improvement of the testing ability.The dopamine selective sensor consisted in this way shows relatively wide linear response range(10-50?mol,50-500?mol)when the limit of detection is 0.1?mol.On this basis,we make a kind of six-membere ring polymer compound which includes metal complex.It can brige inorganic metal and organic polymer.Then some negative photoresist is added to the compound.We adapt screen printing and yello-light technology to make lines with 15 um's trace widths and trace spacing and control CD Loss below 1 um.Through characterization by SEM,BET,metallurgic microscope and four probes,the result shows that the compound's conductivity can reach 350m?/cm2 in 230? low temperature sintering.In the research,we prepare PoPD nanometer ceramic disperse paste.The paste then will be treated by nanometer grinder.When it is characterized by SEM,the original diameter drops from 0.79?m to 200 nm and the content of ceramic powder reaches 80%.We compose the paste and selfmade acrylic polymer yellow-light resin into a nanometer ceramic photoresist.In the process of 3-D aligning on the stacking of equipment,the research shows that 3-D stacking is affected by the shrinkage ratio's change caused by UV radiant energy.At last,we adapt nanometer carbon fibre which includes 5% ceramic quality powder to modify the material's shrinkage stress coefficient.In this way,the 3-D stacking technology is accomplished.As a result,we can adapt printing yellow-light process for the 3-D alignment on ceramic substrate with nanometer silver photoresist and nanometer ceramic photoresist to make 8 um-thick and 12-layer alignment(35 um thick per layer). |
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