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Metal surface deposition and characterization: Ultrahigh vacuum studies and electron beam lithographic studies

Posted on:2009-01-08Degree:Ph.DType:Dissertation
University:The University of TulsaCandidate:Utekar, Pravin CFull Text:PDF
GTID:1441390002491642Subject:Engineering
Abstract/Summary:
An ultrahigh vacuum (UHV) environment is a basic need for gas-solid surface interaction studies. Building the experimental set up involved designing the UHV chamber and instrumentation, principally comprising a reflection absorption infrared spectrometer (RAIRS) to determine the composition of adsorbed molecules on the surface and a mass spectrometer for temperature programmed desorption (TPD) for identifying reaction and decomposition products. This chamber has been built and tested.;Nano-ionics based memory elements accessed by crossbar switching systems offers great potential for future data storage device. We have used the novel approach of crosslinked poly(ethylene oxide) as a memory element at the crosspoint of a crossbar structure. We have modified an existing scanning electron microscope for electron beam lithography application and developed an approach for making the crossbar structure. Characterization of this system is done by scanning electron microscopy, atomic force microscopy, ac impedance spectroscopy and charge-discharge analysis.
Keywords/Search Tags:Electron, Surface
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