3D Nanofabrication Using AFM-Based Ultrasonic Vibration Assisted Nanomachinin

Nanolithography and nanofabrication processes have significant impact on the recent development of fundamental research areas such as physics, chemistry and biology, as well as the modern electronic devices that have reached nanoscale domain such as optoelectronic devices. Many advanced nanofabrication techniques have been developed and reported to satisfy different requirements in both research areas and applications such as electron-beam lithography. However, it is expensive to use and maintain the equipment. Atomic Force Microscope (AFM) based nanolithography processes provide an alternative approach to nanopatterning with significantly lower cost.;Recently, three dimensional nanostructures have attracted a lot of attention, motivated by many applications in various fields including optics, plasmonics and nanoelectromechanical systems. AFM nanolithography processes are able to create not only two dimensional nanopatterns but also have the great potential to fabricate three dimensional nanostructures. The objectives of this research proposal are to investigate the capability of AFM-based three dimensional nanofabrication processes, to transfer the three dimensional nanostructures from resists to silicon surfaces and to use the three dimensional nanostructures on silicon in applications. Based on the understanding of literature, a novel AFM-based ultrasonic vibration assisted nanomachining system is utilized to develop three dimensional nanofabrication processes. In the system, high-frequency in plane circular xy-vibration was introduced to create a virtual tool, whose diameter is controlled by the amplitude of xy-vibration and is larger than that of a regular AFM tip. Therefore, the feature width of a single trench is tunable. Ultrasonic vibration of sample in z-direction was introduced to control the depth of single trenches, creating a high-rate 3D nanomachining process. Complicated 3D nanostructures on PMMA are fabricated under both the setpoint force and z-height control modes. Complex contours and both discrete and continuous height changes are able to be fabricated by the novel 3D nanofabrication processes. Results are imaged clearly after cleaning the debris covering on the 3D nanostructures after nanomachining process. The process is validated by fabricating various 3D nanostructures. The advantages and disadvantages are compared between these two control modes. Furthermore, the 3D nanostructures were further transferred from PMMA surfaces onto silicon surfaces using reactive ion etching (RIE) process. Recipes are developed based on the functionality of the etching gas in the transfer process. Tunable selectivity and controllable surface finishes are achieved by varying the flow rate of oxygen.;The developed 3D nanofabrication process is used as a novel technique in two applications, master fabrication for soft lithography and SERS substrates fabrication. 3D nanostructures were reversely molded on PDMS and then duplicated on new PMMA substrates. 3D nanostructures are fabricated, which can be either directly used or transferred on silicon as SERS substrates after coating 80 nm gold layers. They greatly enhanced the intensity of Raman scattering with the enhancement factor of 3.11x103. These applications demonstrate the capability of the novel process of AFM-based 3D nanomachining.