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The Investigation Of One-dimensional GaN And Ga2O3 Nanostructures Through Ammoniating The Ga2O3/Mo Films On Si Substrates

Posted on:2009-07-23Degree:MasterType:Thesis
Country:ChinaCandidate:S Y ZhangFull Text:PDF
GTID:2121360242494570Subject:Microelectronics and Solid State Electronics
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In this paper,GaN and Ga2O3 nanostructures have been synthesized on Si(111)substrates by ammoniating Ga2O3/Mo fihns of different middle layer thickness.Thestructure,composition,morphology and optical properties of the as-prepared GaN andGa2O3 nanostructures are studied thoroughly.The optical mechanism and growth mechanism of GaN and Ga2O3 nanostructure are firstly explored,and the influences ofdifferent growth conditions on GaN and Ga2O3 nanostructures are investigated also.All theresults are as follows:1. Synthesis of one-dimensional GaN nanostructuresMo middle layers and Ga2O3 films were deposited in turn on Si(111)substrates by aJCK-500A RF magnetron sputtering system (the deposition thickness was 30 nm for Mo layers and 500 nm for Ga2O3 films,respectively),and then as-grownGa2O3/Mo thin filmswere annealed in a conventional tube furnace under flowing ammonia to fabricate GaN nanostructure.The structure,elemental composition and morphology of the GaN nanostructures were determined by X-ray diffraction (XRD),Fourier transformed infraredspectroscopy (FTIR),X-ray photoelectron energy spectroscopy (XPS),scanning electronic microscope (SEM)and high-resolution transmission electronic microscope (HRTEM).Theresults indicate that the as-synthesized GaN nanostructures were hexagonal GaN withwurtzite structure.Different ammoniating temperature and different ammoniating time ofGa2O3 fihns have great influences on the synthesis of GaN nanostructure,showing theirmorphologies as nanowires and nanorods.2. Optical properties of GaN nanostructures and exploration of GaN growth mechanismFor the optical property,the measurement of PL spectrum was performed with a He-Cd laser as the excitation source (wavelength was 325 nm)at room temperature.A strongemission peak at 371.5 nm (ultraviolet band)is found.With changes of experimentalparameters,the locations of the peaks do not move,and only the intensities of them change. Because the as-prepared GaN nanostructures is too large for quantum confinement,and infact the Bohr exciton radius of GaN is 11 nm.The emission peak at 371.5 nm has no blueshift of the band-gap emission compared with the bulk GaN.The growth mechanism can be decribed as vapor-solid (VS)mechanism.Mo obtains easily oxygen from Ga2O3 duringthe high temperature ammoniating process,which accelerates the ammoniation of Ga2O3and make the energy distribution on the substrate surface to become uneven,which mayplay an important role in the formation of GaN nanostructures.3. Synthesis of one-dimensional Ga2O3 nanostructuresMo middle layers and Ga2O3 films were deposited in turn on Si(111)substrates by aJCK-500A RF magnetron sputtering system (the deposition thickness was 300 nm for Molayers and 500 nm for Ga2O3 films,respectively),and then as-grown Ga2O3/Mo thin filmswere annealed in a conventional tube furnace under flowing ammonia to fabricate Ga2O3nanostructure.The results show that the formed nanostructures are Ga2O3 with monoclinicstructure.Different annealing temperature and different annealing time of Ga2O3 films have great influences on the synthesis of Ga2O3 nanostructure,showing their morphologiesas nanowires and nanorods.4. Optical properties of Ga2O3 nanostructures and exploration of Ga2O3 growth mechanismThe measurement of PL spectrum was performed with a He-Cd laser as the excitationsource (wavelength was 325 nm)at room temperature.Two obvious blue-light peakslocated at 411.5 nm and 437.6 nm are found.The blue peaks are known to be attributed tovacancies.After excitation of the acceptor,a hole on the acceptor and an electron on thedonor are created.Then an electron on donor formed by oxygen vacancies (Vo)is captured by a hole on acceptor formed by gallium vacancies (VGa) to form a trapped exciton,whichrecombines to emit a blue photon.However,further work is needed to investigate the PL mechanism of theβ-Ga2O3 nanomaterials.A VS mechanism was still valid in the growthprocess ofβP-Ga2O3 nanostructures in this method.We believe the Mo particles probablyact as the nucleating sites for embryos,which lays the foundations for the growth ofnanostructuredβ-Ga2O3.
Keywords/Search Tags:GaN nanostructures, β-Ga2O3 nanostructures, Magnetron Sputtering, Ammoniating technique
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