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A magnetic resonance investigation of trivalent silicon centers in amorphous silicon dioxide and amorphous silicon nitride

Posted on:1991-02-13Degree:Ph.DType:Dissertation
University:The Pennsylvania State UniversityCandidate:Warren, William LeoFull Text:PDF
GTID:1472390017451278Subject:Physics
Abstract/Summary:
Trivalent silicon centers, E;In the silicon dioxide system the focus has been on trivalent silicon E;In the silicon nitride system, the investigation was centered on another class of silicon dangling bonds, K centers. Using electron nuclear double resonance it was determined that the K center defect is a silicon atom bonded to nitrogens. This study has also revealed the presence of a new paramagnetic defect center in silicon nitride, a nitrogen dangling bond. Collectively, the silicon nitride results provide information regarding the unpaired electron's wave function on the silicon atom, on the nitrogens bonded to the silicon atom, and on a nitrogen atom.;These results may be of considerable importance, since these trivalent silicon centers dominate the electronic properties in the aforementioned amorphous insulators used extensively in silicon integrated circuit technology.
Keywords/Search Tags:Silicon, Amorphous
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