Plasma Ion Assisted Deposition For Large Antireflection Coatings

This paper mainly discusses the performance specification of plasma source (GIS), technology and quality of TiO2 and SiO2 coatings and the technology for large antireflection coatings deposited with plasma-IAD. The research shows that the index of optical coating increases remarkably by using plasma ion assisted deposition and approach to the massive material further, the coating structure is more compacted than the one obtained through conventional deposition method and the adhesive power is high as well.The thickness of film is frequent non-uniform, and factors are a good many. In practice, The production of uniform-thickness coatings from geometric position in the vacuum chamber. Finite element method and Matlab methods are used to simulate the film thickness uniformity. A rotating plane holder is discussed. The influencing parameters of film thickness uniformity, and the method of adjusting the parameters are studied.Antireflection coatings is designed by using the advanced software for optics design , in the process of design the combination of the design software and the classical idea of design to film coefficient is adopted.