| In this research, field emission performances from diamond film growing through Epitaxy method and diamond powders coated with sliver have been studied. The motivation for the experiment is to gain further understanding of the possible mechanism of diamond field emission.The diamond film is grown using a hot filament chemical vapor deposition, basing on the diamond micro-grits on silicon substrates. And the diamond micro-grits are deposited on silicon substrates using electrophoresis coat method, through a solution of diamond micro-grits in ethyl alcohol. It has revealed that emission can be obtained at fields as low as 1.8V/μm. And the field emission measurement was carried out at a pressure of 10-4Pa.Diamond powders coated with sliver are deposited on ITO glass using electrophoresis coating method, through a solution of powders in isopropyl alcohol. Sliver is created from nitrate and then it coat diamond powder in sonication condition, taking advantage of reducibility of dextrose. The diameter of diamond powder is about 1μm. It has revealed that emission can be obtained at field as low as 5 V/μm, and the field emission measurements were carried out at pressure of 10-4Pa. Scanning electron microscopy, X-ray diffractometry, and Raman spectroscopy were employed in order to determine morphology, crystal orientation, and quality.It can be seen from the experiment results that field emission performance of pure diamond is not very good. After eptitaxy and silver coating, its field emission performance can be well improved. It is expecting to realize low-voltage electron and high current density field emission.
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