Preparation Of Diamond Film And Applications In The Machining

The diamond film are deposited using glow discharge plasma Chemical Vapor Deposition (DC PCVD). On the study of diamond films growth rate, crystallization characteristics are influenced by the conditions on methane flux, the discharge current, gas pressure and substrate temperature. Micro-cracks, burst of diamond are analyzed considering the hot-resistance. The ingrindability of CVD diamond is investigated for the diamond tool and dresser.We set up the production process of CVD diamond tools and dresser. Establishment of the large area diamond film surface modification technology make solution of difficulties in the process of welding, in low vacuum environment, by the principle of the thermal diffusion. The Performance of CVD diamond cutter fit the requirements of industrial production; The CVD diamond dressing can be substitute for the natural diamond dressing.