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Study Of The Preparation Of Optical Thin Film By IAD From Ti3O5

Posted on:2007-06-20Degree:MasterType:Thesis
Country:ChinaCandidate:X F HuFull Text:PDF
GTID:2121360182980529Subject:Materials science
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The new film materials have been used more and more in modern High-tech, and it has been a popular discipline. Optical thin film is an important application as a kind of thin film materials, especially in the field of illumination, fiber communication, automobile, etc. The Transparent area of the film of the oxide titanium is 0.35 12μm. As a material of the optical thin film, the film of the oxide titanium has high refractive index, and stable optical performance. It was used in IR film, interference filters and optical catalytic products. Ti3O5 is a stable compound of TixOy, it has many performances like metals. Compared to the TiO2 materials, The Ti3O5 has good blocking identity under the high temperature.The oxide-titanium films were prepared by ion-beam assisted (IAD) on K9 glasses with the Ti3O5 as coating materials. The influence of the coating process such as ion source, angle of incidence temperature of substrate flux of the Oxygen and deposition rate were studied. The optical properties were measured by UV-755B spectrometer, the refractive indices (N) and the extinction coefficient (k) of the thin films were calculated by computer. With the Ti3O5 as coating materials, the optical thin film has the best properties when the angle of incidence is 00;The refractive indices of oxide-titanium films would be higher when the temperatures increase, be lower if the flux of the Oxygen is higher, be higher if the coating deposition rate grow.The optical thin films were deposited by IAD with the Ti3O5 as coating materials under different substrate temperature. The results of the XRD showed that, the thin films were all amorphous structure before annealed. The annealed three films' refraction index (n) increased as the substrate temperature increase. When the annealed temperature increase, there were obvious (101) preferred orientation. After annealed under 400℃, 500℃, 600℃, the refractive index (N) of the optical thin films were increased as the temperature grown.
Keywords/Search Tags:Ion Assistant Deposition, Ti3O5, thin film, Annealing
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