Molecular Dynamics Study Of Deposition And Nanoindentation For Cu₆₄Zr₃₆ Metallic Glass Thin Film

The amorphous alloy film has excellent performance,good magnetic properties,smooth surface,corrosion resistance and fatigue resistance.It has good application potential in many fields such as nano-printing,integrated circuits,electronic components,aerospace,etc.in the future.At present,the research of amorphous alloy thin films is relatively extensive,mainly focusing on the preparation methods,mechanical behavior,corrosion resistance and potential applications of thin films,while the deposition mechanism of thin films is less studied.The study of the deposition mechanism of amorphous alloy thin films can explore the best experimental conditions for the preparation of high-quality thin films,which helps to further broaden its application prospects.In this paper,molecular dynamics is used to simulate the deposition process of Cu₆₄Zr₃₆ amorphous alloy film,and the effect of different deposition parameters on the film quality is studied.The deposited film is annealed,and the effect of annealing on the film is analyzed.Simultaneously simulating the nano-indentation of the film to analyze the related mechanical behavior.In this paper,a Cu₆₄Zr₃₆ amorphous alloy thin film simulation model is established,and the mechanism of the influence of incident energy and deposition rate on the film growth and film quality is studied.The results show that the growth mode of the film is determined by the incident energy.When the incident energy is low,the film grows like an island;and when the incident energy is high,the film grows in layers.The incident angle and deposition rate have little effect on the growth mode of the film.As the incident energy increases,the surface roughness of the film decreases.The incidence angle and the deposition rate have little effect on the surface roughness of the film.As the incident energy and deposition rate increase,the density of the film increases.While as the incident angle increases,the density of the film hardly changes at first,and then the density decreases.This paper analyzes the effect of annealing on the quality of Cu₆₄Zr₃₆ amorphous alloy film.The results show that the surface of the film is smoother after annealing,and the rootmean-square roughness of the film surface is lower than that before annealing.After annealing,the film density has increased,reducing the internal defects of the film.Annealing can also significantly reduce the internal stress of the film which can improve and enhance the performance of the film.This paper completes the simulation of nanoindentation of Cu₆₄Zr₃₆ amorphous alloy thin film.The results show that with the increasing depth of indentation,the film nanoindentation force obtained with an incident energy of 10 e V is always the largest,while the film nanoindentation force obtained with an incident energy of 0.5 e V is always the smallest.In the process of nanoindentation,the significant change in the ratio is mainly icosahedral clusters<0,0,12,0>,and the proportion of this cluster structure decreases significantly with the increase of the indentation depth.Due to the squeezing effect of the indenter,the maximum hydrostatic pressure of the film,the maximum normal-parameter equivalent stress,and high potential energy atoms are all distributed under the indenter.