Studying On Preparation Of Nano-silicon Dioxide Particle

Nanotechnology is the new technology which rises rapidly, was born in the end of 1980's.In July, 1990, the first international nano-ST meeting was held in America Baltimore. Its scope involved the fields between None-macrograhpy and None-micrograhpy, and opened the humanity to know the world the new level. At present nano-technology have been attached much importance by many countries in the world.Nano silicon dioxide usually has many special properties which contribute it to far-ranging of application, and it can be used in these field, as follow: photon crystal, catalyst carrier, rigid ceramic material, gum, dop, chrmatogram filling, macromolecule composite material and so on.At present, the study of nano-silicon dioxide includes preparation method, microstructure, macroscopical physical properties and application. Among these, the preparation is the key, because process and control of preparation have important effect on the microstructure and macroscopical physical properties.In this experiment, preparing silicon dioxide by pyrolyzing rice husk and by inverse microemulsion was chosen. At the same time, the two simple and effective methods of preparation nano-silicon dioxide particle with dispersion, can be obtained, through systematically studying the technology, structure and reactive conditions. Based on these works, the author found out an effective preparation method to prepare the nano-silicon dioxide with well dispersion and well-proportioned distributing.The method of preparing silicon dioxide by thermal processing rice husk uses rice husk as raw material, basing on the changing of reactant temperature and reactant time. The prepared silicon dioxide particles were characterized by means of XRD, SEM and TG-DSC. As a result, the optimal experiment conditions could be defined, nano silicon dioxide particles were prepared successfully on the condition of 520℃and keeping warm for 3h, the results indicate that nano-silicon dioxide has amorphous structure, well dispersion, homogeneous, and mean grain size is about 80nm.