| High-resolution transmission electron microscopy (HRTEM) is a powerful means for identification and study of material microstructure. Attributed to the development of HRTEM, we can make use of it to investigate the microstructure of materials on atomic scales. the main content of this paper is taking advantages of HRTEM to investigate the microstructure during annealing of amorphous CoSi2 and CoSi2 with addition of 5 at % Zr films; the microstructure of ZrCr2 and Zr(Cr,V)2 Laves phase with addition of 2 at % V, and study the influence mechanism of ternary alloying on the ZrCr2 Laves phase stability.The results of TEM observation indicate that amorphous CoSi2 film after annealed at 250℃remains amorphous structure, showing the morphology of fine fiber. After annealed at 350℃, amorphous CoSi2 film starts to crystallize partly, and the crystal phases are CoSi with a little of CoSi2 while the morphology of fine fiber doesn't change. The amorphous CoSi2 with addition of 5 at% Zr film crystallizes after annealed at 550℃with single CoSi2 phase. And the morphology remains fiber structure at this condition mostly. After annealed at 800℃the film crystallizes. Besides CoSi2 phase, there is ZrSi2 phase crystallized out. The morphology of fine fiber transforms to fine equi-axis crystal structure.Taking advantages of HRTEM to study the microstructure at the interface between film sputtered and Si substrate on atomic scale. At the interface between amorphous CoSi2 with addition of 5 at% Zr film and (100) Si substrate after annealed at 550℃, CoSi2 interfacial reactive phase with (100)CoSi2‖(100)Si and [01-1]CoSi2‖[ 011-]Si relationship which is the same as Si is first found. While twinned relationships between CoSi2 interfacial reactive phase and Si substrate taking (1-1-1) or (111) as the twinned face are also found at the interface. CoSi2 interfacial reactive phase grows... |
