Studies On The Structure And Properties Of Ti Films Fabricated By Magnetron Sputtering

Magnetron sputtering is a well-established physical vapor deposition technique. It is used to deposit metallic and compound thin films for a wide range of applications [5,6]. Titanium coatings are especially attractive for biocompatible or mechanical properties[7-9]. Pure Ti films can be used as absorbed material of visible or infrared light, and self-standing Ti coating is promising in ICF physics experiments. For many applications, the precise surface topography is of critical importance. For example, there are many optical, electronic and biomedical applications for which an extremely smooth surface is highly desirable.This paper investigates the effects of sputtering power, deposition time, negative substrate bias and B doping on the deposition rate, structural properties, surface morphology and coating hardness of Ti films. The results of the experiments show that relationship between the deposition rate of films and sputtering power is linear. The results of the deposition rate measurements show that this is weakly affected when bias potential is low. As the bias voltage increases, the deposition rate decreases strongly due to an increase of the layer density and resputtering phenomena. But when the bias voltage exceeds -80V, the decreasing of deposition rate becomes a little slow. The structural properties of the films were characterized by means of XRD. Dramatic differences in the development of the crystal orientation with increasing negative bias for Ti films were found, the preferred orientation of Ti film gradually changes from (002) to (100). As the negative bias increasing, the grain sizes of Ti films were decreased and finally the films became amorphous substances. The cross-sectional SEM views show that substrate bias can suppress columnar growth mode of sputtering Ti films. The surface morphology of Ti films was characterized by means of AFM. The experiments demonstrated that a dense Ti films with smoother surface can be produced by applying negative bias, but substrate biasing deteriorated coating hardness. The grain sizes and the RMS of B-doping Ti films were decreased as the B concent increasing.This Paper consists of four chapters. The first one is an introduction, summarizing the background, significance and related researches. The second chapter depicts the preparation and measurement of Ti films. The third chapter indicates the effect of sputtering power, negative bias and B doping on the structure and performance of Ti films. The fourth one is conclusion, and finally describes what we will do in the following future.