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The Research Of CrN/Cu-TIN Multilayer Films Preparation By High Power Pulsed Magnetron Sputtering On Stainless Steel Surface

Posted on:2016-12-27Degree:MasterType:Thesis
Country:ChinaCandidate:J J WuFull Text:PDF
GTID:2191330476951882Subject:Materials Processing Engineering
Abstract/Summary:PDF Full Text Request
In order to make the Surgical instruments get strong corrosion resistance and stain resistance and other excellent performanceIn this paper, according to the “ lotus effect ”, we etching out of the honeycomb structure of micro/nano surface topography on the surgical instruments material 304 stainless steel surface with chemical solution innovative, then we deposition the Cr/CrN/Cu- TiN multilayer membrane on the surface by high power pulsed magnetron sputtering, the multilayer membrane has strong corrosion resistance and hydrophobicity. We test multilayer structure and performance with scanning electron microscope、X-ray energy spectrometer、X-ray diffraction、metallographic microscope、electrochemical workstation、microhardness tester、automatic coating adhesion scratch tester and contact angle measurement instrument.On the basis of the largest film adhesion, we determine the optimum parameters of depositioning multilayer membrane on the surface of smooth stainless steel, and research substrate bias and excitation current influence on the structure and properties of multilayer membrane, then we etching stainless steel with the chemical solution, research surface topography influence on the structure and properties of multilayer membrane, the main conclusions are as follows:(1) X-ray diffraction phase analysis shows that the multilayer membrane is mainly composed of Cr、CrN and TiN phase, it is consistent with the design of membrane structure;(2) Within a certain range of substrate bias the Cr content increases, the TiN phase content will increase after first decrease, the hardness of multilayer membrane will increase, the film adhesion increases after first decreases, thin-film corrosion potential will be moved positively, the corrosion current density reduces accordingly, the corrosion resistance increase,the hydrophobic of multilayer membrane will be improved;(3) within a certain range of excitation current, TiN and CrN phase content increase after decreases first, the microhardness of multilayer membrane increases, film adhesion increases after decreases first, thin-film corrosion potential will be moved positively, the corrosion current density reduces accordingly,corrosion resistance increase, the hydrophobic of multilayer membrane will be improved;(4) with micro/nano structure surface morphology of multilayer membrane, CrN(111)、TiN(200)、TiN(311) and TiN(400) phase content will decrease, TiN(111) and TiN(220) phase content will increase, microhardness will be reduced, film adhesion will increase, film corrosion resistance and hydrophobicity will increase.
Keywords/Search Tags:high power pulsed magnetron sputtering, micro/nano structure, substate bias voltage, excitation current, contact angle
PDF Full Text Request
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