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Synthesis Of Chloroindium Phthalocyanine And Its Application On The Photo-Sensitive Resistance

Posted on:2008-09-08Degree:MasterType:Thesis
Country:ChinaCandidate:X BaiFull Text:PDF
GTID:2121360245491017Subject:Applied Chemistry
Abstract/Summary:PDF Full Text Request
In this paper, the anhydrous indium trichloride was prepared by azeotropic drying. The chloroindium phthalocyanine was then synthesized by the reaction of anhydrous indium trichloride with 1,3-diiminoisoindoline using o-dichlorobenzene as solvent. The reaction was carried out at 180℃for 5 hours under the atmosphere of nitrogen when the molar ratio between 1,3-diiminoisoindoline and anhydrous indium trichloride was 3.5. The highest yield was 42.9%. A novel method of synthesis of chloroindium phthalocyanine was introduced and discussed in which urea, phthalic anhydride and indium trichloride were raw materials. The reaction was carried out at 130℃for 0.5 hour and 220℃for 4 hours with acetic sodium as catalyst when the molar ratio between urea, phthalic anhydride and indium trichloride was 14:4.5:1 .The highest yield was 71.2%. The structure of the product was charactered by the IR. The UV showed the product had strong absorbance at 228,433 and 836nm. The XRD showed the raw product had a"α"-type crystal figure. The product was purified by 88% sulfuric acid without the phenomenon of shed of the central particle which was confirmed by IR. The product was treated in the mixture of water and butanone which changed amorphous chloroindium phthalocyanine into"β"-type revealed by XRD.The phthalocyanine film was formed on the surface of Indium Tin Oxide (ITO) by impregnation which reduced the difficulty and cost of production sharply. The technique of the production of the photo sensitive resistance was discussed particularly in the component of solution, vibration time, impregnation times and composition. The RMS was 2.492nm and particle diameter ranged from 10 to 300 nm which were respectively tested by AFM and SEM. The smoothness equalized the classical method. The sensitivity and thickness of the resistance was also tested. The highest integral ratio sensitivity of the resistance was 59.5μA·(lx·V)-1 and resistance sensitivity was 9.47×108 which was approximately one thousand higher than the traditional one.
Keywords/Search Tags:Chloroindium Phthalocyanine, Synthesis, Photo Sensitive Resistance, Impregnation, Film
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