Study On Effect Of Cr Coating Deposition Process By The Closed State Of Magnetic Field In Magnetron Sputtering

By adjusting the magnet polarity and magnetic induction intensity of the magnetron at magnetron sputtering equipment, we had obtained different magnetic field configurations. The Cr coatings were deposited at different magnetic field configurations. Investigate the effect of the closed state of magnetic field and magnetic induction intensity to deposit coating process in magnetron sputtering, through detecting the performance and structure of the Cr coating. There is important significance to application study on use appropriate closed state of magnetic field deposit outstanding coatings, and play a guiding role to improve the magnetron sputtering equipment.The results show that with the distance of the substrate-to-target increases, coating thickness decreases, the thickness uniformity of coating to be better on axial. The thickness uniformity of coatings that deposit under closed state and semi-closed state is better, especially between -50mm to 50mm in the axial distance, has more uniform to the coating thickness, suitable for industrial application.Along with the closed degree of magnetic field increases at the same magnetic induction intensity, deposition coatings becomes the equiaxed crystal by the large columnar crystal structure, the vacancy and defect of coatings reduce, the degree of crystallization improves, the roughness smaller, film sheet resistance decreases. On silicon polished wafer whose orientation index is [111], the Cr coating to (211) crystal face preferred grow at unclosed state and to (110) crystal face preferred grow at semi-closed state and closed state. With the magnetic induction intensity increases at the same closed state, deposition coatings becomes the equiaxed crystal by the columnar crystal structure, the vacancy and defect of coatings reduce, the degree of crystallization improves, the roughness smaller, film sheet resistance decreases. On silicon polished wafer whose orientation index is [111], the Cr coating all by (110) crystal face preferred grow at three magnetic induction intensity.