The Study Of Self-Assemble Ordering Nanosturcture Induced By Graphoepitaxy

The constitution of nanostructure has attracted special interest recently. The success of nanotechnology hinges on the ability to rationally arrange functional materials on the nanoscale. The fundamental limitations associated with these traditional top-down lithographic processes are rapidly becoming apparent. The new bottom-up self-assembly technology can fabricate periodic nanostructures over macroscopic length scales. It is compelling because of its simpleness and low cost.In this paper, the method of self-assembling ordered nanostructure induced by graphoepitaxy, belongs to the self-assembly technology. This process uses artificial surface relief structure to induce nanoscale orientation in thin films based on the fundamental of graphoepitaxy, and fabricates block copolymer thin films over macroscopic length scales. We prepare a patterned substrate using lithographic process and atomic force microscopy (AFM) micromachining technique, then chose poly triblock copolymer as a model system. The influence of evaporation speed and solvent annealing combined with graphoepitaxy on microdomain patterns was investigated by tapping-mode AFM technique. We focus on the morphology transition mechanism of the block copolymer in the mesa and trough under the above circumstances. The micro/nano structures were also gained by controlling the thickness of thin films.The method of self-assembling ordered nanostructure induced by graphoepitaxy combined both top-down and bottom-up technique, is a new route toward fabrication of nanostructure. Furthermore, the micro/nano structure we have gained by this method is significative to the development of nano devices.