Study On Preparation And Properties Of TiN Films Deposited On ZL109 Alloy By Multi-arc Techniques

Nowadays, the technology of materials surface treatment has become a powerful tool to improve the properties of materials surface, and has become an important research point in materials science. TiN film whose outstanding performance is high wear and corrosion resistance has been widely applied in the industry. Aluminum alloy has low hardness and yield strength. Compared with the steel and other materials, its wear resistance is poor. Thus its service life is reduced, and the scope of its use is limited. Therefore, hard film, such as TiN film, deposited on the surface of aluminum alloy is very important to increase the scope of application and service life of aluminum alloy.The TiN film is deposited by multi-arc ion plating technology on the surface of ZL109 aluminum alloy in this paper. The deposited technique is researched by the use of orthogonal test of L9(34). Two properties targets which are micro-hardness and wear rate are adopted in this orthogonal test. As the deposited temperature is 300℃, deposited bias voltage is 120V,nitrogen partial pressure is 1.2Pa, and deposited time is 1h, the best comprehensive performance of TiN films is obtained. From the effect of deposited technique to properties, it is found that phase constitution and stress condition seriously affect the properties of TiN film.According to the study of microstructure and phase constitution of TiN film deposited by multi-arc ion plating technology on the surface of ZL109 aluminum, the result shows that the growth pattern of TiN film is in the planar growth mode at the low temperature. As the deposition temperature and time increment, the growth pattern is changed to island mode. And the phase constitution has (111) phase face preferred orientation.The wear resistance test shows that the wear resistance of ZL109 aluminum alloy has been increased about 10 times after depositing TiN film on its surface. The anti-oxidation in the high temperature test shows that the sample with deposited TiN film begins to be oxidized at the temperature 500℃, and seriously oxidized at the temperature 600℃.