The Simulation Of Atmospheric Plasma Polishing Process

Atmospheric pressure plasma technology is the frontier issue in plasma field. Processing optical parts with high-performance and ultra-precision has been a world problem for many years. In recent years, the atmospheric pressure plasma polishing (APPP) comes up, due to its atomic-level chemical removal, very low surface roughness, no surface and sub-surface damage, and higher speed. At present, Domestic and foreign scholars have already started to study APPP technology, but domestic research is still in its infancy, and there are many problems to be resolved. This paper studies APPP technology around simulation and the design of system.The system uses a plasma torch coupled capacitance with the radio frequency source at atmospheric pressure which can generate high density of active particles under normal temperature and pressure. Reactive particles react with silicon surface to form super-smooth.Plasma torch structure is very important to the discharge, using of CFD-ACE+, three styles of torches are analyzed from the perspective of fluid so that the torch with 60°exit is selected; APPP process is also simulated from the perspective of chemical, the distribution of active F is gotten, and the physical and chemical processes of APPP are revealed. Moreover, the sediment produced during the polishing process is analyzed, by traversing the resultant of chemical simulation, the sediment may include CFx. comparing with experimental results, C, CF and CF2 are confirmed as sediment composition, and ways to avoid sediment formation are discussed.For the non-spherical parts on NC, the polishing system is designed. Precise ball screw is used in system to reduce transmission error; AC servo motor is used to ensure stable and reliable motion; PMAC is used in control system for motion control to achieve multi-axis precise control; Finally, other function of APPP system is discussed.