Research On Rapid Thermal Diffusion Furnace And Rapid Thermal Diffusion

This dissertation discussed the design and manufacture of Rapid Thermal Diffusion (RTD) furnace. RTD in c-Si of 2X4 and 103 X 103 size were studied by experiments in the same RTD furnace. The diffusion carrier concentration profile and junction depth were measured and compared with Conventional Furnace Processing diffusion (CFD). It presented following conclusions: 1) The temperature distribution in quartz chamber of RTD furnace is uniform because square resistance is uniform after RTD; 2) The diffusion velocity of RTD furnace by a factor of three compare to Conventional Furnace Processing diffusion (RTD); 3) If diffusion temperature and doping phosphorus are equivalent, doping phosphorus of RTD are more than of CFD in equivalent distance to the silicon surface. This technology and results have not been reported in China.It first researched multicrystalline silicon surface texture by ultrasonic vibration. Selecting the optimal proportion between HF and HNO3, we find the better etching basing on 1min, ultrasonic vibration, 25 , appending Br2 and pits are more uniform on the multicrystalline silicon surface, while better textured surface can be obtained.