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Large Aperture Wavefront Measurement On The Stitching Interferometer

Posted on:2009-09-30Degree:MasterType:Thesis
Country:ChinaCandidate:W Z ZhengFull Text:PDF
GTID:2132360242475296Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
At present, large aperture interferometer is used to test the quality of large aperture optical system, but this method must process high-accuracy standard surface, it is difficult to manufacture, having long manufacture and high cost. So using a small aperture, high precision and high resolution interferometer to recover the large optical component's wavefront phase information, this is a new testing process of large aperture component. It continues having high accuracy of interferometry, and needn't to use the standard surface that is same with total aperture dimension, it also can reduce cost.It through scanned between the testing component and wave surface, obtained different interferometer images, using the superposition part of these interferometer images, eliminated the relative incline and parallel move among them during scanning, accordingly stitch a image. On the basic of theory analysis, establishing physical model and mathematic model, analogue real beam path, achieves the stitching interferometer. Through the calculation it can obtain the precision is 4.3λ‰, it also done the precision analysis to the stitching interferometer.
Keywords/Search Tags:wavefront measurement, stitching interferometer, large aperture optical system, precision analysis
PDF Full Text Request
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