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Studies On Grain-boundary States In Polysilicon Films FET

Posted on:2004-05-18Degree:MasterType:Thesis
Country:ChinaCandidate:K ZhangFull Text:PDF
GTID:2168360092991075Subject:Communication and Information System
Abstract/Summary:PDF Full Text Request
Collaborated with the laboratory of professor Swanson , department of Electrical and E lectronic E ngineering, K ing's C ollege , t he e xperiment u sed i n t his p aper i s carried out successfully. The technique that Opto-Electronic Modulation Spectroscopy(OEMS) using wavelength modulated monochromatic illumination to cyclically excite the trap states first is used in the polycrystalline silicon thin film field effect structure. By means of experiment , response spectrum and phase spectrum are achieved . The spreading of energy phenomenon is noticed . Thereout , the a-Si:H model of grain-boundary is put forward . By analyzing , six energy levels under conduction band are gained . Furthermore, other information is obtained . The proper analysis in the trap states is one of the cores in VLSI , so this paper has determinate realistic significance .
Keywords/Search Tags:Polycrystalline Silicon, Thin Film Transistor, OEMS Spectra, Grain-boundary States
PDF Full Text Request
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