N₂ Micro Hollow Cathode Discharge And The Cathode Plasma Sputtering Process

The process of the nitrogen micro hollow cathode plasma discharge were researched using PIC/MCC model , the basic characteristics of the cathode discharge made some theoretical discussion. One charged particles in the electric field movement and its simple self-consistent field generated by PIC method description, particle collisions and sputtering atoms and background gas collisions between the process by MCC method description. Combined with computer language with mixed model simulated nitrogen micro hollow cathode discharge, calculates the Nitrogen ions （N₂⁺,N⁺） density and average energy spatial distributions. on this basis,also calculated the cathode near the surface of Nitrogen atomic ions （N⁺）, Nitrogen molecular ions （N₂⁺） and electronic density and the average energy distribution. These results can be used as a research sputtering process the bombardment of particles （N₂⁺,N⁺） initial conditions, to research the thermalization process of the sputterde atoms is very useful. Analysis and study the change of discharge parameters of Nitrogen ions（N₂⁺,N⁺） with the average energy and density on the cathode side.Using three-dimensional method of nitrogen micro hollow cathode discharge space about the thermalization process of the sputtered atoms is simulated,fine the thermalization profile of sputtered atoms, as we can see from the graph,the sputtered atoms are most thermalized not far from the cathode. Only consider atoms and background gas elastic collision about the thermalization process of the sputtered atoms. Calculated the average energy of sputtered Titanium atoms and density of spatial distributions,and form the energy distribution of sputtering Titanium atomic and influence factors of sputtering rate.In addition, this article description of the thermalization process of the sputtered titanium atoms in a flat-panel cathode glow discharge using a three-dimensional Monte Carlo method models , resulting in a thermalization profile in the nitrogen gas discharge. Comparison with the thermalization profile of the sputtered copper atoms in Argon gas calculated by Bogaerts, laying a foundation for the simulation of influence about sputtered atoms on the space plasma process .Overall, nitrogen micro hollow cathode discharge is a complex physical process. And each plasma parameter is restricted by various discharge condition restriction in a glow discharge. Research the energy distribution of sputtering atoms in micro hollow cathode discharge space , provides a good basis,for future study the effect about a discharge space, thatfor nitriding materials synthesis and surface nitriding treatment also to have the important meaning.