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Study On The Preparation And Characterization Of Nano-vanadium

Posted on:2015-03-11Degree:MasterType:Thesis
Country:ChinaCandidate:P XiaoFull Text:PDF
GTID:2180330473452887Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
As a high-quality optoelectronic material, vanadium oxide has attracted much attention for a long time, which includes important applications in smart window, photoelectric detection, and information storage etc. Based on the application in smart window, this paper discusses about the influence to optical transmittance cased by different producing conditions.In theoretical analysis, using Ansys, a simulation platform which could help to analyze the preparation environment in magnetron sputtering facility is designed to illustrate the preparation process. By simulating preparing parameters(i.e. location of target, dimension of equipment) and preparing environment(i.e. environmental gas, airflow speed), the optimized preparing method is obtained through changing the preparing conditions by analyzing the influence to films, which serves as a foundation in optimizing preparing method.In experimental research, using electronic glasses as substrates, with the help of constant current Reactive Magnetron Sputtering, vanadium oxide films in varied conditions are prepared under the guides of orthogonal experiment. And their optical properties are also studied, such as infrared and visible light transmittance, phase-transition temperature, the near infrared transmittance contrast factor. Then both the influence of different preparation conditions to the relevant performance and their degrees of importance in the process of preparation are concluded. Then the optical and electrical properties are analyzed with the help of ultraviolet-visible spectrophotometer, XRD, XPS and four point probe technique. This paper mainly discusses the optical properties of vanadium oxide films and their application in smart window. The orthogonal experiment process takes annealing time, annealing temperature and oxygen proportion as three main factors. A three factors three levels orthogonal table is established and the optimized preparation conditions and their influential order are obtained.Through the paper work, other factors which influence the optical properties were also discussed as well: the different optical transmittances using different substrates which turns out that ITO substrate could lead higher optical transmittance than glass substrate; the changes of preparing temperature of substrates which turns out the transmittance of the light within 350nm-1100 nm decreases as the preparation temperature increases; the varied sputtering time which turns out that the transmittance of the light decreases as the sputtering time increases. After the discussion, the method of using antireflection film to improve the transmittance of vanadium oxide films is studied. The random network impedance model is also established to predict the proportion of vanadium with lower and higher charge state using the resistance temperature curve of vanadium oxide films.Through the experimental study, the method of preparing vanadium oxide thin films in hundred of nanometers scale is maintained; through the analysis of vanadium oxide thin films under different preparing conditions, the influence caused by such conditions to the optical properties of films is obtained. The surface structure and component are also analyzed which could be used in future applications.
Keywords/Search Tags:vanadium oxide thin films, magnetron sputtering, transmittance, random network impedance
PDF Full Text Request
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